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首页> 外文期刊>Applied Surface Science >Possible application of laser-induced backside dry etching technique for fabrication of SERS substrate surfaces
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Possible application of laser-induced backside dry etching technique for fabrication of SERS substrate surfaces

机译：激光诱导背面干法刻蚀技术在SERS衬底表面制造中的可能应用

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摘要

Laser-induced backside dry etching (LIBDE) method has proved to be capable of micro- and nanomachin-ing of transparent materials. In present study the applicability of this technique was tested to prepare surface structures that are suitable for surface enhanced Raman scattering (SERS) spectroscopy. Fused silica plates were coated with 16nm thick silver layer by pulsed laser deposition (PLD) method. The metal absorbing film was irradiated and removed by 10 ArF excimer laser (λ = 193nm, FWHM = 20ns) pulses perpendicularly through the transparent samples at 1200mJ/cm2 fluence. The remaining part of the silver coating was dissolved chemically shortly after the experiment using nitric acid. After this the etched holes were re-coated with 10,20 and 40 nm thick silver layers by PLD, respectively. SERS activity of the different parts of the holes was investigated by a Thermo Scientific DXR Raman Microscope at 785 nm wavelength using 10~3 M aqueous solution of Rhodamin 6G as reference sample. SERS spectra were recorded at different areas of the holes having various roughness parameters. It was found that the intensity of the main peaks depended significantly on the surface morphology of the tested area and the thickness of its silver coating.
机译：激光诱导背面干法蚀刻（LIBDE）方法已被证明能够对透明材料进行微加工和纳米加工。在本研究中，对该技术的适用性进行了测试，以制备适合于表面增强拉曼散射（SERS）光谱的表面结构。通过脉冲激光沉积（PLD）方法在熔融石英板上涂上16nm厚的银层。用10 ArF受激准分子激光（λ= 193nm，FWHM = 20ns）以1200mJ / cm2的通量垂直穿过透明样品辐照并除去金属吸收膜。实验后不久，使用硝酸将银涂层的剩余部分化学溶解。此后，通过PLD分别用10,20和40nm厚的银层重新涂覆蚀刻的孔。使用10〜3 M的Rhodamin 6G水溶液作为参考样品，通过Thermo Scientific DXR拉曼显微镜在785 nm波长下研究孔的不同部分的SERS活性。在具有各种粗糙度参数的孔的不同区域记录SERS光谱。发现主峰的强度很大程度上取决于测试区域的表面形态和其银涂层的厚度。

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  • 来源
    《Applied Surface Science》 |2013年第1期|234-240|共7页
  • 作者

    T. Csizmadia; B. Hopp; T. Smausz; J. Kopniczky; I. Hanyecz; A. Sipos; M. Csete; G. Szabo;

  • 作者单位

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

    Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Backside etching; Nanostructure; SERS; PLD; Rhodamine 6G;

    机译：氧化钡蚀刻;纳米结构每次点击费用;PLD;罗丹明SHG;

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