机译:磁控溅射外延生长铝氮化铟纳米棒中的电子输运性质
Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, 43, Sec.4, Keelung Rd., Taipei 10607, Taiwan;
Department of Electronic Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan;
Department of Physics, Chemistry, and Biology (IFM), Linkoeping University, SE-581 83 LinkOping, Sweden;
Department of Physics, Chemistry, and Biology (IFM), Linkoeping University, SE-581 83 LinkOping, Sweden;
Department of Physics, Chemistry, and Biology (IFM), Linkoeping University, SE-581 83 LinkOping, Sweden;
Aluminum indium nitride; Nanorod; Photoconductivity; Magnetron sputter epitaxy;
机译:直流磁控溅射近外延生长氮化铝薄膜的光学性能
机译:金属有机气相外延生长的纤锌矿型氮化铟的电子能带结构和传输性能
机译:缺陷对氨-分子束外延和磁控溅射外延生长的GaN传输性能的影响
机译:反应气体定时RF磁控溅射生长氧氮化铟的化学表征及电性能
机译:调制脉冲功率磁控溅射沉积氮化钛和氮化铝钛涂层的摩擦学和结构性能
机译:N2分压对液靶反应磁控溅射外延沉积GaN纳米棒生长结构和光学性能的影响
机译:磁控溅射外延生长铝氮化铟纳米棒中的电子输运性质