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Characterization of a nanometer-thick sputtered polytetrafluoroethylene film

机译：纳米溅射聚四氟乙烯薄膜的表征

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摘要

Fast growth of nanotechnology, e.g. hard disk drive (HDD) and microelectromechanical sys-temanoelectromechanical system (MEMS/NEMS), requires nanometer-thick protection films with high thermal stability and low surface energy. In this paper, we report the characterization results of a nanometer-thick sputtered polytetrafluoroethylene (PTFE) film prepared by radio frequency (RF) sputtering. Atomic force microscopy (AFM) and X-ray reflectivity (XRR) results show that the nanometer-thick sputtered PTFE film has good uniformity. Thermally programmed desorption (TPD) results show that the film is thermally stable up to 430 ℃ Surface energy measurement via contact angle method shows that the film has low surface energy with the thickness as low as 1.5 nm. X-ray photoelectron spectroscopy (XPS) data suggests that the film has crosslinked molecular structure, which results in amorphous morphology as shown by X-ray diffraction (XRD) data. Nano-indentation testing shows that the sputtered film has higher hardness and modulus than bulk PTFE. The structure-property relationship has been discussed.
机译：纳米技术的快速发展，例如硬盘驱动器（HDD）和微机电系统/纳米机电系统（MEMS / NEMS），需要具有高热稳定性和低表面能的纳米级保护膜。在本文中，我们报告了通过射频（RF）溅射制备的纳米级溅射聚四氟乙烯（PTFE）薄膜的表征结果。原子力显微镜（AFM）和X射线反射率（XRR）结果表明，纳米厚溅射PTFE薄膜具有良好的均匀性。热程序解吸（TPD）结果表明，该膜在430℃时具有热稳定性。通过接触角法测量表面能表明该膜具有低表面能，厚度低至1.5 nm。 X射线光电子能谱（XPS）数据表明该膜具有交联的分子结构，这导致非晶形态，如X射线衍射（XRD）数据所示。纳米压痕测试表明，溅射薄膜的硬度和模量高于膨体聚四氟乙烯。已经讨论了结构属性关系。

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