机译:射频磁控溅射制备p型CuAlO_2薄膜的光学性能
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;
rf magnetron sputtering; CuAlO_2 thin films; photoluminescence;
机译:溅射沉积的纳米晶p型透明CuAlO_2薄膜的尺寸依赖性光学性质。
机译:反应性射频磁控溅射沉积p型SnO薄膜的结构,光学和电学性质
机译:低温缓冲,射频功率和退火对射频磁控溅射生长的ZnO / Al_2O_3(0001)薄膜的结构和光学性能的影响
机译:通过RF磁控溅射在各种基材上生长的ZnO薄膜的结构和光学性质
机译:射频磁控溅射生长的GaN薄膜的特性用于制造AlGaN / GaN HEMT生物传感器
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:错误:“低温缓冲液,RF功率和退火对由RF-磁控溅射生长的ZnO / Al2O3(0001)薄膜结构和光学性质的影响”J。苹果。物理。 106,023511(2009)