Resistless patterning of a chlorine monolayer on a Si(001) surface with an electron beam

著录项

• 来源
  《Applied Surface Science》 |2011年第21期|p.8794-8797|共4页
• 作者

  C.Jeon; H.-N. Hwang; H.-J. Shin; C-Y. Park; C.-C. Hwang;

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• 作者单位

  BK21 Physics Research Division and Center for Nanotube and Nanostructured Composites (CNNC) Sungkyunkwan University, Suwon 440-746, Republic of Korea;

  Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784, Republic of Korea;

  Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784, Republic of Korea;

  BK21 Physics Research Division and Center for Nanotube and Nanostructured Composites (CNNC) Sungkyunkwan University, Suwon 440-746, Republic of Korea,Department of Energy Science, Sungkyunkwan University, Suwon 440-746, Republic of Korea;

  Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784, Republic of Korea;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  synchrotron radiation photoelectron; spectroscopy; electron stimulated desorption; silicon; chlorine;

  机译：同步辐射光电子光谱学电子激发解吸硅氯;