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Study Of Microstructure And Nanomechanical Properties Of Zr Films Prepared By Pulsed Magnetron Sputtering

机译:脉冲磁控溅射制备Zr薄膜的微观结构和纳米力学性能的研究

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摘要

The present work studies the effect of substrate temperature on the growth characteristics of zirconium films prepared by pulsed magnetron sputtering. Formation of a-phase of zirconium was observed in the temperature range 300-873 K. X-ray diffraction of Zr films revealed predominantly [001] texture. It is noticed that crystallite size increases with increasing substrate temperature. Hexagonal shaped crystallites seem to grow along the surface normal of the substrate for the films deposited at 773 K. Nanoindentation measurements showed that the hardness of the films is in the range 6-10GPa. The scratch test indicated that the films deposited at higher substrate temperatures had excellent bonding with the substrate and no significant critical failure was noticed up to an applied load of 20 N.
机译:本工作研究了衬底温度对通过脉冲磁控溅射制备的锆膜生长特性的影响。在300-873 K的温度范围内观察到锆的a相形成。Zr膜的X射线衍射显示出[001]织构为主。注意到,微晶尺寸随着基板温度的升高而增加。对于在773 K处沉积的薄膜,六角形微晶似乎沿着基板的表面法线生长。纳米压痕测量表明,薄膜的硬度在6-10GPa范围内。划痕试验表明,在较高的基材温度下沉积的薄膜与基材的粘合性极佳,并且在施加20 N的负载时未发现明显的严重破坏。

著录项

  • 来源
    《Applied Surface Science》 |2011年第23期|p.9909-9914|共6页
  • 作者单位

    Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

    Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

    Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

    Surface and Nano Science Division, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

    Surface and Nano Science Division, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

    Surface and Nano Science Division, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

    UCC-DAE Consortium for Scientific Research, Indore 452 017, India;

    Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Sputtering; Zirconium; X-ray diffraction; Nanohardness; Scratch test;

    机译:溅射;锆;X射线衍射;纳米硬度;划痕试验;

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