机译:脉冲磁控溅射制备Zr薄膜的微观结构和纳米力学性能的研究
Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
Surface and Nano Science Division, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
Surface and Nano Science Division, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
Surface and Nano Science Division, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
UCC-DAE Consortium for Scientific Research, Indore 452 017, India;
Materials Synthesis and Structural Characterization Section, Physical Metallurgy Croup, Indira Candhi Centre for Atomic Research, Kalpakkam 603 102, India;
Sputtering; Zirconium; X-ray diffraction; Nanohardness; Scratch test;
机译:氮气流量对脉冲直流磁控溅射制备Zr-N薄膜的微观结构和纳米力学性能的影响
机译:脉冲直流电抗磁控溅射纳米结构Cr-Zr-N和Cr-Zr-Si-N薄膜的微观结构,力学和电化学性能评估
机译:磁控溅射制备的共沉积Ti-Cr薄膜的微观结构和纳米力学性能
机译:脉冲直流磁控溅射制备ZrAlN薄膜的微观结构,纳米力学和摩擦学性能
机译:脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
机译:磁控溅射制备CrNx / Ag多层膜的微观结构和力学性能
机译:脉冲磁控溅射制备的纳米结构Ti-Zr-N薄膜的性质:施加功率效应