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Sputter deposition of high transparent TiO2-xNx/TiO2/ZnO layers on glass for development of photocatalytic self-cleaning application

机译:在玻璃上溅射沉积高透明的TiO2-xNx / TiO2 / ZnO层,以开发光催化自清洁应用

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摘要

In this study, TiO2_xNx/TiO2 double layers thin film was deposited on ZnO (80nm thickness)/soda-lime glass substrate by a dc reactive magnetron sputtering. The TiO2 film was deposited under different total gas pressures of 1 Pa, 2 Pa, and 4 Pa with constant oxygen flow rate of 0.8 seem. Then, the deposition was continued with various nitrogen flow rates of 0.4,0.8, and 1.2 seem in constant total gas pressure of 4 Pa. Post annealing was performed on as-deposited films at various annealing temperatures of 400, 500, and 600 °C in air atmosphere to achieve films crystallinity. The structure and morphology of deposited films were evaluated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and atomic force microscopy (AFM). The chemical composition of top layer doped by nitrogen was evaluated by X-ray photoelectron spectroscopy (XPS). Photocatalytic activity of samples was measured by degradation of Methylene Blue (MB) dye. The optical transmittance of the multilayer film was also measured using ultraviolet-visible light (UV-vis) spectrophotometer. The results showed that by nitrogen doping of a fraction (~l/5) of TiCh film thickness, the optical transmittance of TiO2_xNx/TiO2 film was compared with TiO2 thin film. Deposited films showed also good photocatalytic and hydrophilicity activity at visible light.
机译:在这项研究中,TiO2_xNx / TiO2双层薄膜通过直流反应磁控溅射沉积在ZnO(厚度为80nm)/钠钙玻璃板上。 TiO2膜是在1Pa,2Pa和4Pa的不同总气压下以0.8sccm的恒定氧气流量沉积的。然后,在总气压恒定为4 Pa的情况下,以各种氮气流量分别为0.4、0.8和1.2 sccm继续沉积。在400、500和600°C的各种退火温度下对沉积的薄膜进行后退火在空气中达到薄膜的结晶度。通过X射线衍射(XRD),场发射扫描电子显微镜(FE-SEM)和原子力显微镜(AFM)对沉积膜的结构和形态进行了评估。通过X射线光电子能谱(XPS)评价氮掺杂的顶层的化学组成。通过亚甲基蓝(MB)染料的降解来测量样品的光催化活性。还使用紫外可见光(UV-vis)分光光度计测量了多层膜的透光率。结果表明,通过对TiCh薄膜厚度的一小部分(〜l / 5)进行氮掺杂,将TiO2_xNx / TiO2薄膜的透光率与TiO2薄膜进行了比较。沉积的膜在可见光下也显示出良好的光催化和亲水活性。

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