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Growth behavior and magnetic property of electroless NiCoFeP films

机译:化学镀NiCoFeP薄膜的生长行为和磁性

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摘要

The electroless NiCoFeP films were deposited on a silicon substrate in a bath containing Ni~(2+), Co~(2+), and Fe~(2+) ions with a concentration ratio of 1:1.9:1.2. These films were characterized by using transmission electron microscope, energy dispersive X-ray spectrometer, and alternating gradient magnetometer for their microstructure, crystal structure, and magnetic properties. The result showed that the film deposited at the initial stage (about 10 s) consists of only one phase with a crystal structure of FCC Ni and a composition about Ni (69 at%), Co (19 at%), Fe (4 at%), and P (7 at%); The film deposited at the latter stage (about 30 s) consists of two phase, one is similar to that of initial stage and the other has crystal structure of HCP Co with a composition about Ni (35 at%), Co (44at%), Fe (19at%), and P (2 at%). The saturation magnetization and coercivity of electroless NiCoFeP films vary from 525 to 1546 emu/cm3 [0.68-2.01 T] and from 51.44 to 88.5 Oe [4.09-7.04 kA/m], respectively.
机译:将化学镀的NiCoFeP薄膜沉积在含Ni〜(2 +),Co〜(2+)和Fe〜(2+)离子的浴中的硅基板上,其浓度比为1:1.9:1.2。通过使用透射电子显微镜,能量色散X射线光谱仪和交替梯度磁强计对这些膜的微观结构,晶体结构和磁性进行表征。结果表明,在初始阶段(约10 s)沉积的膜仅由一个具有FCC Ni晶体结构和约Ni(69at%),Co(19at%),Fe(4at。%)组成的相组成。 %)和P(7 at%);在后期(约30 s)沉积的膜由两相组成,一相类似于初始相,另一相具有HCP Co的晶体结构,其成分约为Ni(35 at%),Co(44at%) ,铁(19at%)和磷(2at%)。化学镀NiCoFeP膜的饱和磁化强度和矫顽力分别从525到1546 emu / cm3 [0.68-2.01 T]和51.44到88.5 Oe [4.09-7.04 kA / m]。

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  • 来源
    《Applied Surface Science》 |2011年第5期|p.1806-1812|共7页
  • 作者单位

    Department of Materials Science and Engineering, National Formosa University. 64, Wunhua Road, Huwei, Yunlin, 632, Taiwan;

    Department of Materials Science and Engineering, National Formosa University. 64, Wunhua Road, Huwei, Yunlin, 632, Taiwan;

    Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douiiou, Yunlin, 64002, Taiwan;

    Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douiiou, Yunlin, 64002, Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    NiCoFeP films; electroless plating; growth behavior; magnetic property;

    机译:NiCoFeP膜;化学镀生长行为;磁性;

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