机译:氮分压对电弧离子镀Al-Ti-N薄膜的影响
School of Materials Science and Engineering, Anhui University of Technology, Maanshan City, Anhui Province, 243002, PR China;
School of Materials Science and Engineering, Anhui University of Technology, Maanshan City, Anhui Province, 243002, PR China;
School of Materials Science and Engineering, Anhui University of Technology, Maanshan City, Anhui Province, 243002, PR China;
School of Materials Science and Engineering, Anhui University of Technology, Maanshan City, Anhui Province, 243002, PR China;
School of Materials Science and Engineering, Anhui University of Technology, Maanshan City, Anhui Province, 243002, PR China;
School of Materials Science and Engineering, Anhui University of Technology, Maanshan City, Anhui Province, 243002, PR China;
AlTiN film; macroparticles; nanoindentation; adhesion;
机译:负偏压对多电弧离子电镀沉积的Al-Ti-N膜微观结构和性能的影响
机译:Ar / N_2真空电弧放电沉积ZrNx膜的结构,机械,电学和润湿性能:氮分压的影响
机译:电弧离子镀沉积氮掺杂类金刚石碳膜的结构表征
机译:具有不同N_2分压的阴极真空弧沉积的Ti-Al-N膜的表征
机译:低压氮对氮化钛电弧离子镀钛阴极源的影响。
机译:靶成分和溅射沉积参数对沉积在聚合物基底上的氮化银-坡莫合金柔性薄膜功能性能的影响
机译:电弧离子镀C掺杂TiO2薄膜的研究