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首页> 外文期刊>Applied Surface Science >The Al-doping and post-annealing treatment effects on the structural and optical properties of ZnO:Al thin films deposited on Si substrate
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The Al-doping and post-annealing treatment effects on the structural and optical properties of ZnO:Al thin films deposited on Si substrate

机译：Al掺杂和退火后处理对沉积在Si衬底上的ZnO：Al薄膜的结构和光学性能的影响

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摘要

Al-doped ZnO (ZnO:Al) thin films with different Al contents were deposited on Si substrates using the radio frequency reactive magnetron sputtering technique. X-ray diffraction (XRD) measurements showed that the crystallinity of the films was promoted by appropriate Al content (0.75 wt.%). Then the ZnO:Al film with Al content of 0.75 wt.% was annealed in vacuum at different temperatures. XRD patterns revealed that the residual compressive stress decreased at higher annealing temperatures. While the surface roughness of the ZnO:Al film annealed at 300 C became smoother, those of the ZnO:Al films annealed at 600 and 750 ℃ became rougher. The photoluminescence (PL) measurements at room temperature revealed a violet, two blue and a green emission. The origin of these emissions was discussed and the mechanism of violet and blue emission of ZnO: Al thin films were suggested. We concluded that the defect centers are mainly ascribed to antisite oxygen and interstitial Zn in annealed (in vacuum) ZnO:Al films.
机译：采用射频反应磁控溅射技术，将不同Al含量的Al掺杂ZnO（ZnO：Al）薄膜沉积在Si衬底上。 X射线衍射（XRD）测量表明，适当的Al含量（0.75重量％）促进了膜的结晶度。然后将Al含量为0.75wt。％的ZnO：Al膜在不同温度下在真空中退火。 XRD图谱表明，残余退火应力在较高的退火温度下降低。在300℃退火的ZnO：Al膜的表面粗糙度变得更平滑，而在600和750℃退火的ZnO：Al膜的表面粗糙度变得更粗糙。室温下的光致发光（PL）测量显示出紫色，两个蓝色和绿色发射。讨论了这些发射的起源，并提出了ZnO：Al薄膜的紫色和蓝色发射机理。我们得出的结论是，缺陷中心主要归因于退火（真空）ZnO：Al薄膜中的反位氧和间隙Zn。

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  • 来源
    《Applied Surface Science》 |2010年第13期|p.4304-4309|共6页
  • 作者

    J.J. Ding; H.X. Chen; S.Y. Ma;

  • 作者单位

    College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou, Gansu 730070, China;

    College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou, Gansu 730070, China;

    College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou, Gansu 730070, China;

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  • 正文语种 eng
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  • 关键词

    ZnO thin films; RF magnetron sputtering; X-ray diffraction; optical properties;

    机译：ZnO薄膜;射频磁控溅射;X射线衍射;光学性质;

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