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首页> 外文期刊>Applied Surface Science >Deposition of thick and adherent Teflon-like coating on industrial scale stainless steel shell using pulsed dc and RF PECVD
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Deposition of thick and adherent Teflon-like coating on industrial scale stainless steel shell using pulsed dc and RF PECVD

机译：使用脉冲直流电和RF PECVD在工业规模的不锈钢外壳上沉积厚且粘附的特氟龙状涂层

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摘要

A unique combination of pulsed dc and radio frequency (RF) discharge deposition was used to deposit thick (～5 μm) and adherent (2-4 MPa) Teflon-like coatings on a stainless steel (SS) shell of 2 m diameter size, through plasma enhanced chemical vapor deposition (PECVD). The details of deposition on such a big industrial scale component are reported for the first time. In this method, highly adherent thin interface layers were grown on SS shell that was electrically grounded, using pulsed dc discharge, followed by RF discharge deposition to build up the required coating thickness. The fluorocarbon precursor molecules, required for the deposition of Teflon-like coating, are generated indigenously by pyrolyzing the Teflon powder. The deposited coating was studied for its chemical bond state, surface roughness (Ra), morphology, thickness, and adhesive strength. These studies were carried out by using XPS, AFM, SEM, etc. The adhesive strength of the coating was measured by pin-pull test as per ASTM D4541 standard test. The coatings deposited with pulsed dc discharge were observed to have higher adhesive strength when compared with those deposited with RF discharge.
机译：脉冲直流和射频（RF）放电沉积的独特组合被用于在直径2 m的不锈钢（SS）外壳上沉积厚（〜5μm）和粘附（2-4 MPa）的特氟龙状涂层，通过等离子体增强化学气相沉积（PECVD）。如此大规模的工业规模沉积的细节首次被报道。在这种方法中，使用脉冲直流放电在高度接地的SS外壳上生长高附着力的薄界面层，然后通过射频放电沉积来增加所需的涂层厚度。聚四氟乙烯状涂层沉积所需的碳氟化合物前体分子是通过热解聚四氟乙烯粉末而天然产生的。研究了沉积涂层的化学键状态，表面粗糙度（Ra），形态，厚度和粘合强度。这些研究是通过使用XPS，AFM，SEM等进行的。根据ASTM D4541标准测试，通过推拉法测量涂层的粘合强度。与射频放电沉积的涂层相比，脉冲直流放电沉积的涂层具有更高的粘合强度。

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  • 来源
    《Applied Surface Science》 |2010年第13期|p.4334-4338|共5页
  • 作者

    A. Satyaprasad; S.K. Nema; N.K. Sinha; Baldev Raj;

  • 作者单位

    FCIPT, Institute for Plasma Research, Bhat, Gandhinagar 382428, India Institute for Plasma Research, Department of Atomic Energy, FCIPT, A-10/B, GIDC, Sector 25, Gandhinagar, Gujarat 382044, India;

    FCIPT, Institute for Plasma Research, Bhat, Gandhinagar 382428, India;

    Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

    Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    teflon-like coating; plasma; PECVD; pulsed dc; RF; box coater;

    机译：铁氟龙状涂层;等离子体;PECVD;脉冲直流射频;箱式涂布机;

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