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Comparison of surface films formed on titanium by pulsed Nd:YAG laser irradiation at different powers and wavelengths in nitrogen atmosphere

机译:氮气气氛中不同功率和波长的Nd:YAG脉冲激光辐照在钛上形成的表面膜的比较

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摘要

The nitridation of titanium (Ti) caused by a Q-switched Nd:YAG laser under nitrogen gas atmosphere was investigated in situ using X-ray photoelectron spectroscopy (XPS). A laser having a wavelength of 1064nm and 532 nm (SHG mode) was irradiated on a titanium substrate in an atmosphere-controlled chamber, and the substrate was then transported to an XPS analysis chamber without exposing it to air. The characteristics of the surface layer strongly depend on the laser power. When the power is relatively low, a titanium dioxide layer containing a small amount of nitrogen is formed on the substrate. Laser irradiation beyond a certain laser power is required to obtain a stoichiometric titanium nitride (TiN) layer. A TiN layer and an oxynitride layer with a TiO_xN_y-like structure are formed as the topmost and the lower surface layer, respectively, when the laser power exceeds this threshold value. The threshold laser power strongly depends on the wavelength of the laser, and this threshold value for the 532-nm laser is quite lower than that for the 1064-nm laser.
机译:使用X射线光电子能谱(XPS)对在氮气气氛下调Q开关Nd:YAG激光引起的钛(Ti)的氮化进行了研究。在气氛控制室中的钛基板上照射波长为1064nm和532nm的激光(SHG模式),然后将基板传送到XPS分析室而不暴露于空气。表面层的特性在很大程度上取决于激光功率。当功率相对较低时,在基板上形成包含少量氮的二氧化钛层。为了获得化学计量的氮化钛(TiN)层,需要超过一定激光功率的激光照射。当激光功率超过该阈值时,分别形成具有TiO_xN_y状结构的TiN层和氧氮化物层作为最上表面层和下表面层。阈值激光功率很大程度上取决于激光器的波长,并且532 nm激光器的该阈值比1064 nm激光器的阈值低得多。

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