• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Applied Surface Science >Preparation and characterization of patterned copper sulfide thin films on n-type TiO_2 film surfaces
【24h】

Preparation and characterization of patterned copper sulfide thin films on n-type TiO_2 film surfaces

机译：n型TiO_2薄膜表面图案化硫化铜薄膜的制备与表征

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Micro-arrayed patterns of p-type copper sulfide (Cu_xS) thin films with positive and negative features were deposited onto the surfaces of n-type TiO_2 semiconductor films via a selective nucleation and growth process from aqueous solution. The surface functional molecules of the UV photo-oxidised patterned SAMs were utilized to direct the nucleation and growth of Cu_xS crystallites. The resultant Cu_xS/TiO_2 composite films with negative and positive Cu_xS patterns on the TiO_2 film surface were investigated using SEM, XRD, XPS and a 3D Surface Profiler. It is demonstrated that regular and compact patterned films of Cu_2S crystallites had been deposited onto the n-type TiO_2 surface, with sharp edges demarcating the boundaries between the patterned Cu_2S region and the TiO_2 film region. The UV-vis spectra for three Cu_2S/TiO_2 films exhibit a wide absorption between 300 nm and 450 nm. The maximum wavelength differences in the spectra of Cu_2S/TiO_2 films and TiO_2 film were attributed to the added absorption of Cu_2S films at 302 nm and the unchanged adsorption of TiO_2 films. The absorption intensities of the Cu_2S/TiO_2 films could be varied in the UV-vis range using the Cu_2S patterned features (positive, negative).
机译：通过水溶液中的选择性成核和生长过程，将具有正负特征的p型硫化铜（Cu_xS）薄膜的微阵列图案沉积在n型TiO_2半导体膜的表面上。紫外光氧化的图案化SAM的表面功能分子被用来指导Cu_xS微晶的成核和生长。使用SEM，XRD，XPS和3D表面轮廓仪研究了在TiO_2薄膜表面具有负Cu_xS图案和正Cu_xS图案的Cu_xS / TiO_2复合薄膜。结果表明，规则且致密的Cu_2S微晶构图膜沉积在n型TiO_2表面上，尖锐的边缘划定了构图的Cu_2S区与TiO_2膜区之间的边界。三种Cu_2S / TiO_2薄膜的UV-vis光谱在300 nm至450 nm之间显示出较宽的吸收率。 Cu_2S / TiO_2薄膜和TiO_2薄膜在光谱上的最大波长差归因于302nm处Cu_2S薄膜的增加吸收和TiO_2薄膜的不变吸附。使用Cu_2S图案化特征（正，负），可以在UV-vis范围内改变Cu_2S / TiO_2薄膜的吸收强度。

著录项

  • 来源
    《Applied Surface Science》 |2010年第23期|P.7316-7322|共7页
  • 作者

    Yongjuan Lu; Gewen Yi; Junhong Jia; Yongmin Liang;

  • 作者单位

    State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, No. 18 Tianshui Road, Lanzhou 730000, PR China Graduate School of Chinese Academy of Sciences, Beijing 10049, PR China;

    rnState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, No. 18 Tianshui Road, Lanzhou 730000, PR China;

    rnState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, No. 18 Tianshui Road, Lanzhou 730000, PR China;

    rnState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, No. 18 Tianshui Road, Lanzhou 730000, PR China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    copper sulfide; thin film; micropattern; characterization; optical property;

    机译：硫化铜薄膜;微图案表征;光学性质;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号