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首页> 外文期刊>Applied Surface Science >Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition
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Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition

机译：脉冲激光沉积生长NiO薄膜的结构，电学和机械性能

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摘要

Nickel oxide (NiO) thin films were prepared by reactive pulsed laser deposition on thermally oxidized Si substrates in 10 Pa oxygen pressure. The substrate temperature during deposition was varied and its influence on the structural, electrical and nanomechanical properties was studied. It was proved that the structural properties were affected by the increase of substrate temperature improving the crystalline structure. Furthermore, a higher substrate temperature resulted in a thicker NiO film, which was attributed to an increased grain size. This effect influenced the electrical properties, too. Resistivity measurements showed that it increased with the increase of substrate temperature. For the first time, the nanomechanical properties of NiO films were studied. The formation and improvement of crystalline structure affected the nanomechanical properties. Nanoindentation testing of NiO thin films revealed an increase of hardness (H) and elastic modulus (E) and a decrease of surface roughness when increasing the substrate temperatre.
机译：氧化镍（NiO）薄膜是通过在10 Pa的氧气压力下在热氧化的Si衬底上进行反应性脉冲激光沉积而制备的。改变沉积过程中的衬底温度，并研究其对结构，电学和纳米机械性能的影响。事实证明，衬底温度的提高会影响结构性能，从而改善晶体结构。此外，较高的基板温度导致较厚的NiO膜，这归因于晶粒尺寸的增加。该效应也影响电性能。电阻率测量表明，它随着衬底温度的升高而增加。首次研究了NiO薄膜的纳米力学性能。晶体结构的形成和改善影响了纳米机械性能。 NiO薄膜的纳米压痕测试显示，当提高基材温度时，硬度（H）和弹性模量（E）会增加，表面粗糙度会降低。

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  • 来源
    《Applied Surface Science》 |2010年第2期|p.429-433|共5页
  • 作者

    I. Fasaki; A. Koutoulaki; M. Kompitsas; C. Charitidis;

  • 作者单位

    National Hellenic Research Foundation, Theoretical and Physical Chemistry Institute, Vasileos Konstantinou Ave. 48, 11635 Athens, Greece,National Technical University of Athens, School of Chemical Engineering, 9 Iroon Polytechniou St., 15780 Zografou, Athens, Creece;

    National Hellenic Research Foundation, Theoretical and Physical Chemistry Institute, Vasileos Konstantinou Ave. 48, 11635 Athens, Greece,National Technical University of Athens, School of Chemical Engineering, 9 Iroon Polytechniou St., 15780 Zografou, Athens, Creece;

    National Technical University of Athens, School of Chemical Engineering, 9 Iroon Polytechniou St., 15780 Zografou, Athens, Creece;

    National Technical University of Athens, School of Chemical Engineering, 9 Iroon Polytechniou St., 15780 Zografou, Athens, Creece;

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  • 正文语种 eng
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  • 关键词

    PLD; thin film deposition; nickel oxide; structural; electrical; mechanical properties;

    机译：PLD;薄膜沉积;氧化镍结构电气机械性能;

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