Spectroscopic ellipsometry of SiO_2/CdTe nanocomposite thin films prepared by dc magnetron sputtering

S.K. Bera; D. Bhattacharyya; R. Ghosh; G.K. Paul

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Spectroscopic ellipsometry of SiO_2/CdTe nanocomposite thin films prepared by dc magnetron sputtering

机译：直流磁控溅射制备SiO_2 / CdTe纳米复合薄膜的光谱椭圆

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SiO_2/CdTe nanocomposites were prepared in thin film form on quartz substrate using a multi-target dc magnetron sputtering system. The films were deposited at high pressure (～15Pa) with deposition temperature ranging from 240 to 260 K. The films were characterized by microstructural studies and phase modulated spectroscopic ellipsometry along with optical transmittance measurements. The ellipsometric spectra were recorded in the wavelength range of 300-1200 nm. The spectra were fitted theoretically with an appropriate model assuming a realistic sample structure. Variations of refractive index, extinction coefficient and dielectric constant with wavelength have been derived.

机译：SiO_2 / CdTe纳米复合材料是在石英衬底上使用多靶直流磁控溅射系统以薄膜形式制备的。薄膜在高压（〜15Pa）下沉积，沉积温度范围为240至260K。通过微观结构研究，相调制光谱椭偏仪以及光学透射率测量对薄膜进行表征。椭圆光谱在300-1200nm的波长范围内记录。假设样品结构真实，理论上用合适的模型拟合光谱。得出了折射率，消光系数和介电常数随波长的变化。

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来源
《Applied Surface Science》 |2009年第14期|6634-6640|共7页
作者
S.K. Bera; D. Bhattacharyya; R. Ghosh; G.K. Paul;
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作者单位

Department of Physics, Tamralipta Mahavidyalaya, Tamluk - 721636, Purba Medinipur, West Bengal, India;

Spectroscopy Division, Bhabha Atomic Research Centre, Mumbai - 400 085, India;

School of Applied Sciences, Haldia Institute of Technology, Haldia - 721657, Purba Medinipur, West Bengal, India;

School of Applied Sciences, Haldia Institute of Technology, Haldia - 721657, Purba Medinipur, West Bengal, India;

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正文语种 eng
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nanocomposites; magnetron sputtering; spectroscopic ellipsometry;

机译：纳米复合材料磁控溅射;椭圆偏振光谱;

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机译：直流反应磁控溅射制备的TiO2薄膜的光谱椭圆偏振光谱研究：退火温度效应
2. Influence of sputtering power on structural, optical and electrical properties of CdTe thin films prepared by DC magnetron sputtering [J] . Peng Gu, Xinghua Zhu, Jitao Li, Journal of materials science . 2018,第17期

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3. Optical constants of DC magnetron sputtered titanium dioxide thin films measured by spectroscopic ellipsometry [J] . Karunagaran B., Kumar RTR., Viswanathan C., Crystal Research and Technology: Journal of Experimental and Industrial Crystallography . 2003,第9期

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5. In situ spectroscopic ellipsometry studies of silicon film crystallinity and interface structure deposited by DC reactive magnetron sputtering. [D] . Yang, Yonghong. 1996

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Spectroscopic ellipsometry of SiO_2/CdTe nanocomposite thin films prepared by dc magnetron sputtering

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