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Effects Of Thermal Annealing Temperature And Duration On Hydrothermally Grown Zno Nanorod Arrays

机译:热退火温度和持续时间对水热生长的Zno纳米棒阵列的影响

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摘要

In this study, the effects of thermal annealing temperature and duration on ZnO nanorod arrays fabricated by hydrothermal method were investigated. The annealed ZnO/Si(111) substrate was used for ZnO nanorod array growth. The effects of annealing treatment on the structural and optical properties were investigated by scanning electron microscopy, X-ray diffraction, and room-temperature photoluminescence measurements. With the annealing temperature of 750 ℃ and the annealing duration of 10 min, both the structural and optical properties of the ZnO nanorod arrays improved significantly, as indicated in the X-ray diffraction and photoluminescence measurement.
机译:本研究研究了热退火温度和持续时间对水热法制备的ZnO纳米棒阵列的影响。退火的ZnO / Si(111)基板用于ZnO纳米棒阵列的生长。通过扫描电子显微镜,X射线衍射和室温光致发光测量研究了退火处理对结构和光学性能的影响。 X射线衍射和光致发光测试表明,在750℃的退火温度和10 min的退火时间下,ZnO纳米棒阵列的结构和光学性能均得到显着改善。

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