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Ellipsometry investigation of the effects of annealing temperature on the optical properties of indium tin oxide thin films studied by Drude-Lorentz model

机译:椭偏光度法研究Drude-Lorentz模型研究退火温度对氧化铟锡薄膜光学性能的影响

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摘要

Float glass substrates covered by high quality ITO thin films (Balzers) were subjected for an hour to single thermal treatments at different temperature between 100 ℃ and 600 ℃. In order to study the electric and optical properties of both annealed and not annealed ITO-covered float glasses, ellipsometry, spectrophotometry, impedance analysis, and X-ray measurements were performed. Moreover, variable angle spectroscopic ellipsometry provides relevant information on the electronic and optical properties of the samples. ITO film is modeled as a dense lower layer and a surface roughness layer. The estimated optical density for ITO and the optical density of the surface roughness ITO layer increases with the annealing temperature. In the near-IR range, the extinction coefficient decreases while the maximum of the absorption in the near UV range shift towards low photon energy as the annealing temperature increases. Spectrophotometry was used to estimate the optical band-gap energy of the samples. The thermal annealing changes strongly the structural and optical properties of ITO thin films, because during the thermal processes, the ITO thin film absorbs oxygen from air. This oxygen absorption decreases the oxygen vacancies therefore the defect densities in the crystalline structure of the ITO thin films also decrease, as confirmed both by ellipsometry and X-ray measurements.
机译:用高质量ITO薄膜覆盖的浮法玻璃基板(Balzers)在100℃至600℃的不同温度下进行了一个小时的单次热处理。为了研究退火和未退火的ITO覆盖的浮法玻璃的电学和光学性质,进行了椭圆光度法,分光光度法,阻抗分析和X射线测量。此外,变角光谱椭圆仪提供了有关样品的电子和光学性质的相关信息。 ITO膜建模为致密的下层和表面粗糙度层。估计的ITO的光密度和表面粗糙度ITO层的光密度随退火温度的增加而增加。在近红外范围内,随着退火温度的升高,消光系数减小,而近紫外范围内的吸收最大值向低光子能量转移。分光光度法用于估计样品的光学带隙能量。热退火极大地改变了ITO薄膜的结构和光学性能,因为在热处理过程中,ITO薄膜会吸收空气中的氧气。这种氧吸收降低了氧空位,因此,如椭圆偏振法和X射线测量所证实的,ITO薄膜的晶体结构中的缺陷密度也降低了。

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  • 来源
    《Applied Surface Science》 |2009年第16期|7203-7211|共9页
  • 作者单位

    INFM-CNR-LICRYL Laboratory and CEMIF.CAL, Department of Physics, University of Calabria, via P. Bucci 31C, Rende (CS) 1-87036, Italy;

    INFM-CNR-LICRYL Laboratory and CEMIF.CAL, Department of Physics, University of Calabria, via P. Bucci 31C, Rende (CS) 1-87036, Italy;

    INFM-CNR-LICRYL Laboratory and CEMIF.CAL, Department of Physics, University of Calabria, via P. Bucci 31C, Rende (CS) 1-87036, Italy;

    INFM-CNR-LICRYL Laboratory and CEMIF.CAL, Department of Physics, University of Calabria, via P. Bucci 31C, Rende (CS) 1-87036, Italy;

    INFM-CNR-LICRYL Laboratory and CEMIF.CAL, Department of Physics, University of Calabria, via P. Bucci 31C, Rende (CS) 1-87036, Italy;

    INFM-CNR-LICRYL Laboratory and CEMIF.CAL, Department of Physics, University of Calabria, via P. Bucci 31C, Rende (CS) 1-87036, Italy;

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  • 正文语种 eng
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  • 关键词

    indium tin oxide thin films; ellipsometry investigation; optical properties; thermal annealing;

    机译:铟锡氧化物薄膜;椭偏测量光学性质热退火;

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