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首页> 外文期刊>Applied Surface Science >Comparable study on the effect of diluted NH_4Cl solution on the postdeposition surface texture of as-deposited aluminum-doped zinc oxide films by direct current pulse and direct current reactive magnetron sputtering
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Comparable study on the effect of diluted NH_4Cl solution on the postdeposition surface texture of as-deposited aluminum-doped zinc oxide films by direct current pulse and direct current reactive magnetron sputtering

机译：直流脉冲和直流反应磁控溅射法稀释NH_4Cl溶液对沉积的铝掺杂氧化锌薄膜沉积后表面织构影响的比较研究

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摘要

Effect of 5.0% diluted NH_4Cl aqueous solution was comparably investigated on the postdepositionrnsurface texture of the as-deposited smooth aluminum-doped zinc oxide (AZO) films by direct current pulse reactive magnetron sputtering (DCP-sputtering) and direct current reactive magnetron sputtering (DC-sputtering). The as-deposited AZO films by DCP-sputtering showed an effective surface texture for light trapping upon the etching of 5.0% diluted NH_4Cl solution, while the as-deposited AZO films by DC-sputtering demonstrated an obscure surface texture upon the same etching treatment. The different result might be attributable to a big difference in film strain and film compactness. The formation of interstitial Zn, interstitial Al and grain boundary is the key to realize effective surface texture for the as-deposited AZO films.
机译：比较了通过直流脉冲反应磁控溅射（DCP溅射）和直流反应磁控溅射（DC）对5.0％稀释NH_4Cl水溶液对沉积的光滑掺杂铝的氧化锌（AZO）膜沉积后表面织构的影响。 -溅射）。通过DCP溅射沉积的AZO膜在刻蚀5.0％稀释的NH_4Cl溶液时显示出有效的光陷获表面纹理，而通过DC溅射沉积的AZO膜在相同的刻蚀处理下显示出模糊的表面纹理。不同的结果可能归因于薄膜应变和薄膜致密性的巨大差异。间隙Zn，间隙Al和晶界的形成是实现沉积的AZO膜有效表面纹理的关键。

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  • 来源
    《Applied Surface Science》 |2009年第16期|7268-7272|共5页
  • 作者

    Xiaoyong Gao; Qinggeng Lin; Hongliang Feng; Yongsheng Chen; Shie Yang; Jinhua Gu; Weiqiang Li; Jingxiao Lu;

  • 作者单位

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

    The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China;

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  • 正文语种 eng
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  • 关键词

    AZO film; NH_4Cl aqueous solution; surface texture; magnetron sputtering;

    机译：AZO膜;NH_4Cl水溶液;表面纹理;磁控溅射;

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