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Modification of the surface properties of polyimide films using polyhedral oligomeric silsesquioxane deposition and oxygen plasma exposure

机译:使用多面体低聚倍半硅氧烷沉积和氧等离子体暴露来修饰聚酰亚胺薄膜的表面性能

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Topographically rich surfaces were generated by spray-coating organic solutions of a polyhedral oligomeric silsesquioxane, octakis(dimethylsilyloxy)silsesquioxane (POSS), on Kapton® HN films and exposing them to radio frequency generated oxygen plasma. Changes in both surface chemistry and topography were observed. High-resolution scanning electron microscopy indicated substantial modification of the POSS-coated polyimide surface topographies as a result of oxygen plasma exposure. Water contact angles varied from 104° for unexposed POSS-coated surfaces to ~5° for samples exposed for 5 h. Modulation of the dispersive and polar contributions to the surface energy was determined using van Oss Good Chaudhury theory. Changes in surface energy are related to potential adhesive interactions with lunar dust simulant particles.
机译:通过在Kapton®HN薄膜上喷涂多面体低聚倍半硅氧烷,八(二甲基甲硅烷氧基)倍半硅氧烷(POSS)的有机溶液,并将其暴露于射频产生的氧等离子体中,可生成具有丰富地形的表面。观察到表面化学和形貌的变化。高分辨率扫描电子显微镜表明,由于氧等离子体暴露,对POSS涂层的聚酰亚胺表面形貌进行了实质性修改。水接触角从未暴露的POSS涂层表面的104°到暴露5 h的样品的〜5°不等。使用van Oss Good Chaudhury理论确定对表面能的色散和极性贡献的调制。表面能的变化与与月尘模拟颗粒的潜在胶粘剂相互作用有关。

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