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Evolution of surface morphology of NiO thin films under swift heavy ion irradiation

机译:快速重离子辐照下NiO薄膜表面形貌的演变

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摘要

NiO nanoparticle thin films grown on Si substrates were irradiated by 107 MeV Ag~(8+) ions. The films were characterized by glancing angle X-ray diffraction and atomic force microscopy. Ag ion irradiation was found to influence the shape and size of the nanoparticles. The pristine NiO film consisted of uniform size (~100 nm along major axis and ~55 nm along minor axis) elliptical particles, which changed to also of uniform size (~63 nm) circular shape particles on irradiation at a fluence of 3 × 10~(13) ions cm~(-2). Comparison of XRD line width analysis and AFM data revealed that the particles in the pristine films are single crystalline, which turn to polvcrvstalline on irradiation with 107 MeV Ag ions.
机译:用107 MeV Ag〜(8+)离子辐照在Si衬底上生长的NiO纳米颗粒薄膜。通过掠射角X射线衍射和原子力显微镜对膜进行表征。发现银离子辐射影响纳米颗粒的形状和尺寸。原始的NiO膜由均匀尺寸的椭圆形颗粒组成(长轴约为100 nm,短轴约为55 nm),在以3×10的注量照射后,其形状也变为均匀大小(约63 nm)的圆形颗粒〜(13)个离子cm〜(-2)。 XRD线宽分析和AFM数据的比较表明,原始薄膜中的颗粒是单晶的,在用107 MeV Ag离子辐照后会变成多结晶晶体。

著录项

  • 来源
    《Applied Surface Science》 |2009年第2期|521-523|共3页
  • 作者单位

    Department of Physics, North Orissa University, Baripada 757003, India;

    School of Material Science & Technology, Institute of Technology, BHU, Varanasi 221005, India;

    Institute of Physics, Bhubaneswar 751005, India;

    Department of Physics, Utkal University, Vani Vihar, Bhubaneswar, Orissa 751004, India;

    Inter-University Accelerator Center, P.O. Box 10502, New Delhi 110067, India;

    Institute of Physics, Bhubaneswar 751005, India;

    Inter-University Accelerator Center, P.O. Box 10502, New Delhi 110067, India;

    Institute of Physics, Bhubaneswar 751005, India;

    Department of Physics, Utkal University, Vani Vihar, Bhubaneswar, Orissa 751004, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ion irradiation; nanoparticles; atomic force microscopy; NiO;

    机译:离子辐射纳米粒子原子力显微镜氧化镍;

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