机译:Si(111)表面生长的硅化薄膜的电子结构
Graduate School of Science and Technology, Chiba University, Chiba 263-8522, Japan;
Graduate School of Science and Technology, Chiba University, Chiba 263-8522, Japan;
Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;
The Institute for Solid State Physics, The University of Tokyo, Kashiwa 277-8581, Japan;
Graduate School of Advanced Integration Science, Chiba University, Yayoi-cho 1-33, Inage-ku, Chiba 263-8522, Japan;
The Institute for Solid State Physics, The University of Tokyo, Kashiwa 277-8581, Japan;
Graduate School of Advanced Integration Science, Chiba University, Yayoi-cho 1-33, Inage-ku, Chiba 263-8522, Japan;
electronic structure; rare-earth silicide; angle-resolved photoelectron spectroscopy; low-energy electron diffraction;
机译:SI(111)7X7上表观生长的硅化RB薄膜的表面原子结构
机译:Si(111)外延生长的二维稀土硅化物的电子结构和费米表面
机译:Si(001)和(111)表面上硅化纳米结构的动力学
机译:Si(111)上薄YB硅化物膜的形成,光学性质和电子结构
机译:Si(111)和MgO(001)表面上超薄铁膜的原子和电子结构
机译:Ag(111)表面上高温生长的二维硅的界面耦合和电子结构
机译:Si(111)外延生长的二维稀土硅化物的电子结构和费米表面
机译:在si(111)上生长的邻近si(111)表面和ag薄膜的RHEED研究