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Electronic structure of dysprosium silicide films grown on a Si(111) surface

机译:Si(111)表面生长的硅化薄膜的电子结构

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The thickness-dependent electronic structures of Dy silicide films grown on a Si(111) surface have been investigated by angle-resolved photoelectron spectroscopy. Two (1×1) periodic bands, both of them cross the Fermi level, have been observed in the silicide films formed by Dy coverages of 1.0 monolayer and below, and more than five (3~(1/2) × 3~(1/2)) periodic bands have been observed in thicker films. Taking the (2(3~(1/2)) × 2(3~(1/2))) periodic structure of Dy atoms in the submonolayer silicide film into account, the periodicity of the two metallic bands indicate that they mainly originate from the orbitals of Si atoms, which form a (1 × 1) structure. Of the (3~(1/2) × 3~(1/2)) periodic bands observed in thick films, four of them are well explained by the folding of the (1 × 1) bands into a (3~(1/2) × 3~(1/2)) periodicity. Regarding the other band, the three (3~(1/2) × 3~(1/2)) periodic bands would originate from the electronic states related to the inner Si layers that form a (3~(1/2) × 3~(1/2)) structure, and the one observed in the 3.0 ML film only might originate from the electron located at the interface between bulk Si and the Dy silicide film.
机译:通过角度分辨光电子能谱研究了生长在Si(111)表面上的Dy硅化物膜的厚度依赖的电子结构。在由1.0单层及以下的Dy覆盖形成的硅化物膜中观察到两个(1×1)周期带,都跨越费米能级,并且超过五个(3〜(1/2)×3〜( 1/2))在较厚的薄膜中观察到周期性带。考虑到亚单层硅化物膜中Dy原子的(2(3〜(1/2))×2(3〜(1/2)))周期性结构,两个金属带的周期性表明它们主要是由于来自形成(1×1)结构的Si原子的轨道。在厚膜中观察到的(3〜(1/2)×3〜(1/2))周期带中,其中的四个通过将(1×1)带折叠成(3〜(1 / 2)×3〜(1/2))周期。关于另一个能带,三个(3〜(1/2)×3〜(1/2))周期性能带起源于与形成(3〜(1/2)× 3〜(1/2))结构,而仅在3.0 ML膜中观察到的一种结构可能源自位于体硅与Dy硅化物膜之间界面的电子。

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