An ion momentum as a novel parameter for the preparation of the magnetostrictive thin film

著录项

• 来源
  《Applied Surface Science》 |2009年第4期|1265-1267|共3页
• 作者

  Koji Makita; Mitsuaki Takeuchi; Masashi Sato; Hirohisa Uchida; Yoshihito Matsumura;

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• 作者单位

  Department of Applied Science, Graduate School of Engineering, Tokai University, 1117, Kita-Kaname, Hiratsuka, Kanagawa 259-1292, Japan;

  Department of Applied Science, Graduate School of Engineering, Tokai University, 1117, Kita-Kaname, Hiratsuka, Kanagawa 259-1292, Japan;

  Department of Applied Chemistry, School of Engineering, Tokai University, Japan;

  Department of Applied Science, Graduate School of Engineering, Tokai University, 1117, Kita-Kaname, Hiratsuka, Kanagawa 259-1292, Japan;

  Department of Applied Science, Graduate School of Engineering, Tokai University, 1117, Kita-Kaname, Hiratsuka, Kanagawa 259-1292, Japan;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  giant magnetostriction; thin film; ion bombardment; internal stress; magnetostrictive susceptibility; ion momentum; sputtering process;

  机译：巨大的磁致伸缩薄膜;离子轰击内部压力磁致伸缩磁化率离子动量溅射工艺;