Bi surfactant effects of Co/Cu multilayered films prepared by sputter deposition

著录项

• 来源
  《Applied Surface Science》 |2009年第4期|1257-1260|共4页
• 作者

  Masao Kamiko; Atsuhito Nakamura; Kazuaki Aotani; Ryoichi Yamamoto;

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• 作者单位

  Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

  Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

  Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

  Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  surface segregation; surfactant; epitaxy; metallic multilayers; sputtering; giant magnetoresistance;

  机译：表面偏析;表面活性剂外延金属多层;溅射巨磁阻;