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Study On The Orientation Of Silver Films By Ion-beam assisted Deposition

机译：离子束辅助沉积银膜取向的研究

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Low energy ion beam assisted deposition (IBAD) was employed to prepare Ag films on Mo/Si (100) substrate. It was found that Ag films deposited by sputtering method without ion beam bombardment were preferred (111) orientation. When the depositing film was simultaneously bombardment by Ar~+ beam perpendicular to the film surface at ion/atom arrival ratio of 0.18, the prepared films exhibited weak (111) and (200) mixed orientations. When the direction of Ar~+ beam was off-normal direction of the film surface, Ag films showed highly preferred (111) orientation. Monte Carlo method was used to calculate the sputtering yields of Ar~+ ions at various incident and azimuth angles. The effects of channeling and surface free energy on the crystallographic orientation of Ag films were discussed.
机译：低能离子束辅助沉积（IBAD）用于在Mo / Si（100）衬底上制备Ag膜。发现通过溅射方法沉积的没有离子束轰击的Ag膜是优选的（111）取向。当沉积膜同时受到垂直于膜表面的Ar〜+离子/原子到达比为0.18的轰击时，制备的膜表现出弱的（111）和（200）混合取向。当Ar +束的方向偏离膜表面的法线方向时，Ag膜表现出高度优选的（111）取向。采用蒙特卡罗方法计算了不同入射角和方位角下Ar〜+离子的溅射产率。讨论了沟道效应和表面自由能对银膜晶体取向的影响。

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