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首页> 外文期刊>Applied Surface Science >Surface Characteristics And Nanoindentation Study Of Ni-mn-ga Ferromagnetic Shape Memory Sputtered Thin Films
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Surface Characteristics And Nanoindentation Study Of Ni-mn-ga Ferromagnetic Shape Memory Sputtered Thin Films

机译：Ni-mn-ga铁磁形状记忆溅射薄膜的表面特性和纳米压痕研究

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摘要

In present paper, the off-stoichiometric Ni-Mn-Ga ferromagnetic shape memory alloy thin films are fabricated using radio frequency magnetron sputtering method. The compositions, microstructures and mechanical properties of the thin films are characterized by energy dispersive X-ray spectrum (EDAX), X-ray photoelectron spectroscopy (XPS), scanning electronic microscope (SEM), atomic force microscope (AFM) and nanoindentation test, respectively. The results show that there is a thinner layer of oxides consisting of NiO, Ga_2O_3 and an unspecified manganese oxidation (Mn_xO_y) at the surface, whereas a small amount of MnO precipitates exist in internal layers of post-annealed Ni-Mn-Ga thin films. The hardness and elastic modulus decrease with increasing film thickness. Nanoindentation tests reveal that the hardness and elastic modulus of the films can be up to 5.5 and 155 GPa, respectively. The Ni-Mn-Ga thin films have remarkably improved the ductility of Ni-Mn-Ga ferromagnetic shape memory alloys bulk materials.
机译：本文采用射频磁控溅射方法制备了非化学计量的Ni-Mn-Ga铁磁形状记忆合金薄膜。薄膜的组成，微观结构和力学性能通过能量色散X射线光谱（EDAX），X射线光电子能谱（XPS），扫描电子显微镜（SEM），原子力显微镜（AFM）和纳米压痕测试来表征，分别。结果表明，在表面退火后，由NiO，Ga_2O_3和未指定的锰氧化物（Mn_xO_y）组成的氧化物层较薄，而在退火后的Ni-Mn-Ga薄膜的内层中存在少量的MnO析出物。 。硬度和弹性模量随着膜厚度的增加而降低。纳米压痕测试表明，薄膜的硬度和弹性模量分别可以达到5.5 GPa和155 GPa。 Ni-Mn-Ga薄膜显着改善了Ni-Mn-Ga铁磁形状记忆合金块状材料的延展性。

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