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首页> 外文期刊>Applied Surface Science >Cleaning Results Of New And Fouled Nanofiltration Membrane Characterized By Contact Angle, Updated Dspm, Flux And Salts Rejection
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Cleaning Results Of New And Fouled Nanofiltration Membrane Characterized By Contact Angle, Updated Dspm, Flux And Salts Rejection

机译：接触角，更新的Dspm，助焊剂和盐分排斥特性表征的新型污垢纳滤膜的清洁结果

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摘要

In membrane process industries, membrane cleaning is one of the most important concerns from both economical and scientific points of view. Though cleaning is important to recover membrane performance, an inappropriate selection of cleaning agents may result into unsatisfactory cleaning or irreparable membrane. In this study the cleaning performance has been studied with measurements of membrane contact angle, Updated Donnan steric partitioning pore model (UDSPM) and salt rejection as well as flux measurement. Thin film nanofiltration (NF) membranes such as DK, HL and DL provided by GE Osmonics are used in this study. Tests were carried out with virgin DK, HL and DL as well as fouled DK membranes. Several cleaning agents were investigated; some of them were analytical grade such as HCl, NaOH and others such as SDS, mix agents were commercial grade agents that are already in use in commercial plants. Contact angle, DSPM and salt rejection as well as flux of virgin and fouled membranes before and after chemical cleaning were measured and compared. The contact angle measurements with and without chemical cleaning of different virgin and fouled membranes revealed very interesting results which may be used to characterise the membrane surface cleanliness. The contact angle results revealed that the cleaning agents are found to modify membrane surface properties (hydrophobicity/hydrophilicity) of the treated and untreated virgin and fouled membranes. The details of these results were also investigated and are reported in the paper. However, UDSPM method did not give any valuable information about pore size of the untreated and treated NF membranes. The salt rejection level of monovalent and divalent ions before and after cleaning by high and low pH cleaning agents is also investigated and is reported in the paper.
机译：从经济和科学的角度来看，在膜加工工业中，膜清洁是最重要的问题之一。尽管清洁对于恢复膜性能很重要，但清洁剂选择不当可能会导致清洁效果不佳或无法修复的膜。在这项研究中，通过测量膜接触角，更新的Donnan空间分配孔模型（UDSPM）和除盐率以及通量测量来研究清洁性能。 GE Osmonics提供的薄膜纳米过滤（NF）膜，例如DK，HL和DL，用于本研究。使用原始的DK，HL和DL以及结垢的DK膜进行测试。研究了几种清洁剂；其中一些是分析级的，例如HCl，NaOH，其他一些是例如SDS，混合剂是商业级试剂，已经在商业工厂中使用。测量并比较了化学清洗前后的接触角，DSPM和脱盐率以及未处理的膜和污损的膜通量。使用和不使用化学清洁方法对不同的原始膜和结垢的膜进行接触角测量后，得出了非常有趣的结果，可用于表征膜表面清洁度。接触角结果表明，发现清洁剂改变了处理过的和未处理过的原始膜和污损膜的膜表面性能（疏水性/亲水性）。还对这些结果的细节进行了调查，并在论文中进行了报道。但是，UDSPM方法未提供有关未处理和已处理NF膜孔径的任何有价值的信息。本文还研究了用高pH和低pH清洁剂清洁前后的一价和二价离子的脱盐率。

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