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首页> 外文期刊>Applied Surface Science >Visible-light Photocatalytic Activity Of Nitrogen-doped Tio_2 Thin Film Prepared By Pulsed Laser Deposition
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Visible-light Photocatalytic Activity Of Nitrogen-doped Tio_2 Thin Film Prepared By Pulsed Laser Deposition

机译：脉冲激光沉积制备掺氮Tio_2薄膜的可见光催化活性

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摘要

Nitrogen-doped titanium dioxide (TiO_(2-x)N_x) thin films have been prepared by pulse laser deposition on quartz glass substrates by ablated titanium dioxide (rutile) target in nitrogen atmosphere. The x value (nitrogen concentration) is 0.567 as determined by X-ray photoelectron spectroscopy measurements. UV-vis spectroscopy measurements revealed two characteristic deep levels located at 1.0 and 2.5 eV below the conduction band. The 1.0 eV level is attributable to the O vacancy state and the 2.5 eV level is introduced by N doping, which contributes to narrowing the band-gap by mixing with the O2p valence band. The enhanced degradation efficiency in a broad visible-light range was observed from the degradation of methylene blue and methylene orange by the TiO_(2-x)N_x film.
机译：已经通过在氮气氛中通过烧蚀的二氧化钛（金红石）靶在石英玻璃基板上脉冲激光沉积来制备氮掺杂的二氧化钛（TiO_（2-x）N_x）薄膜。通过X射线光电子能谱测量法测定的x值（氮浓度）为0.567。紫外可见光谱测量显示两个特征性深能级，分别位于导带以下1.0和2.5 eV。 1.0 eV的水平归因于O空位状态，而2.5 eV的水平由N掺杂引入，这有助于通过与O2p价带混合来缩小带隙。通过TiO_（2-x）N_x膜对亚甲基蓝和亚甲基橙的降解，观察到了在宽可见光范围内增强的降解效率。

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