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Formation Of Au Nano-patterns On Various Substrates Using Simplified Nano-transfer Printing Method

机译:简化的纳米转移印刷法在各种基底上形成金纳米图案

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摘要

For future device applications, fabrication of the metal nano-patterns on various substrates, such as Si wafer, non-planar glass lens and flexible plastic films become important. Among various nano-patterning technologies, nano-transfer print method is one of the simplest techniques to fabricate metal nano-patterns. In nano-transfer printing process, thin Au layer is deposited on flexible PDMS mold, containing surface protrusion patterns, and the Au layer is transferred from PDMS mold to various substrates due to the difference of bonding strength of Au layer to PDMS mold and to the substrate. For effective transfer of Au layer, self-assembled monolayer, which has strong bonding to Au, is deposited on the substrate as a glue layer. In this study, complicated SAM layer coating process was replaced to simple UV/ozone treatment, which can activates the surface and form the -OH radicals. Using simple UV/ozone treatments on both Au and substrate, Au nano-pattern can be successfully transferred to as large as 6 in. diameter Si wafer, without SAM coating process. High fidelity transfer of Au nano-patterns to non-planar glass lens and flexible PET film was also demonstrated.
机译:对于将来的设备应用,在各种衬底上,例如硅晶片,非平面玻璃透镜和柔性塑料膜上的金属纳米图案的制造变得重要。在各种纳米图案技术中,纳米转移印刷法是制造金属纳米图案的最简单技术之一。在纳米转移印刷工艺中,薄的Au层沉积在柔性PDMS模具上,其中包含表面突起图案,并且由于Au层与PDMS模具以及与AMS的粘合强度不同,Au层从PDMS模具转移到各种基材上。基质。为了有效转移Au层,将与Au牢固粘合的自组装单层作为胶层沉积在基板上。在这项研究中,将复杂的SAM层涂覆工艺替换为简单的UV /臭氧处理,该处理可以激活表面并形成-OH自由基。通过在Au和衬底上使用简单的UV /臭氧处理,可以将Au纳米图案成功转移到直径6英寸的Si晶圆上,而无需进行SAM涂层工艺。还证明了金纳米图案向非平面玻璃透镜和柔性PET膜的高保真转印。

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