The Properties Of La_(0.7)sr_(0.3)mno_3 Films Prepared By Dc Magnetron Sputtering Using Nanosized Powder Compacted Target: Effect Of Substrate Temperature

Dipti Ranjan Sahu

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The Properties Of La_(0.7)sr_(0.3)mno_3 Films Prepared By Dc Magnetron Sputtering Using Nanosized Powder Compacted Target: Effect Of Substrate Temperature

机译：纳米粉末压实靶磁控溅射制备La_（0.7）sr_（0.3）mno_3薄膜的性能：衬底温度的影响

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La_(0.7)Sr_(0.3)MnO_3 (LSMO) thin films have been deposited on Si(1 0 0) substrates at different substrate temperatures in a mixed argon and oxygen atmosphere by dc sputtering using LSMO targets prepared from nanosized powder. The influence of the deposition temperature on the structural, magnetic and transport properties of LSMO films were studied. The results show that in our experimental conditions, the LSMO thin films deposited at 650℃ have the best crystalline quality. Magnetic and magnetotransport studies show the highest Curie temperature (T_c) of 300 K and metal insulator transition temperature (T_(MI)) of 250 K at room temperature.

机译：La_（0.7）Sr_（0.3）MnO_3（LSMO）薄膜已通过使用由纳米级粉末制备的LSMO靶材通过dc溅射在混合氩气和氧气气氛中在不同衬底温度下沉积在Si（1 0 0）衬底上。研究了沉积温度对LSMO薄膜结构，磁性和传输性能的影响。结果表明，在我们的实验条件下，在650℃下沉积的LSMO薄膜具有最佳的结晶质量。磁和磁传输研究显示，室温下居里温度（T_c）最高，为300 K，金属绝缘体的最高转变温度（T_（MI））为250K。

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来源
《Applied Surface Science》 |2008年第5p1期|p.1870-1873|共4页
作者
Dipti Ranjan Sahu;
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作者单位

Institute of Materials Science, Bhubaneswar 751013, India;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
dc sputtering; lsmo films; cmr; magnetic and magnetotransport properties;

机译：直流溅射;lsmo膜;cmr;磁和磁传输性质;

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1. Lateral parameter variations on the properties of La_(0.7)Sr_(0.3)MnO_3 films prepared on Si (1 0 0) substrates by dc magnetron sputtering [J] . Dipti Ranjan Sahu Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2010,第1期

机译：直流磁控溅射在Si（1 0 0）衬底上制备的La_（0.7）Sr_（0.3）MnO_3薄膜的横向参数变化
2. La_(0.67)Ca_(0.33)MnO_3 thin films on Si (1 0 0) by DC magnetron sputtering technique using nanosized powder compacted target [J] . D.R. Sahu, D.K. Mishra, S.H. Hung, Materials Research Bulletin . 2007,第6期

机译：利用纳米粉末压实靶通过直流磁控溅射技术在Si（1 0 0）上制备La_（0.67）Ca_（0.33）MnO_3薄膜
3. La_(0.67)Ca_(0.33)MnO_3 thin films on Si (100) by DC magnetron sputtering technique using nanosized powder compacted target [J] . D.R. Sahu, D.K. Mishra, S.H. Hung, Materials Research Bulletin . 2007,第6期

机译：使用纳米粉末压实靶材通过直流磁控溅射技术在Si（100）上制备La_（0.67）Ca_（0.33）MnO_3薄膜
4. MAGNETORESISTIVE PROPERTIES OF MAGNETRON SPUTTERED La_(0.7)Sr_(0.3)MnO_3 THIN FILMS [C] . E. S. Vlakhov, K. A. Nenkov, A. Y. Spasov Workshop on Nanoscience nanotechnology : Nanostructured materials application and innovation transfer . 2002

机译：磁控溅射LA_（0.7）SR_（0.3）MNO_3薄膜的磁阻性能
5. The deposition and characterization of high dielectric constant films prepared by pulsed reactive DC magnetron sputtering technique. [D] . Kim, Jin-Young. 2000

机译：脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
6. Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films [O] . Jie Li, Xingkang Yi, Wenbo Hu, 2019

机译：磁控溅射沉积非晶碳膜的基体温度相关的微观结构和电子诱导的二次电子发射特性
7. Local tetragonal distortion in La_{0.7}Sr_{0.3}MnO_3 strained thin films probed by x-ray absorption spectroscopy [O] . Souza-Neto, Narcizo M., Ramos, Aline Y., Tolentino, Hélio C. N., 2004

机译：La_ {0.7} sr_ {0.3} mnO_3应变薄膜的局部四方畸变通过X射线吸收光谱探测

The Properties Of La_(0.7)sr_(0.3)mno_3 Films Prepared By Dc Magnetron Sputtering Using Nanosized Powder Compacted Target: Effect Of Substrate Temperature

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