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Effects Of An External Magnetic Field In Pulsed Laser Deposition

机译：外部磁场对脉冲激光沉积的影响

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Thin films were grown by pulsed laser deposition, PLD, on Si (100) substrates by the ablation of a sintered ceramic SrFe_(12)O_(19) target with and without the presence of a nonhomogeneous magnetic field of μ_oH = 0.4 T perpendicular to substrate plane and parallel to the plasma expansion axis. The field was produced by a rectangular-shaped Nd-Fe-B permanent magnet and the substrate was just placed on the magnet surface (Aurora method). An appreciable increment of optical emission due to the presence of the magnetic field was observed, but no film composition change or thickness increment was obtained. It suggests that the increment of the optical emission is due mainly to the electron confinement rather than confinement of ionic species.
机译：在不存在垂直于μ_oH= 0.4 T的非均匀磁场的情况下，通过烧蚀烧结陶瓷SrFe_（12）O_（19）靶，在Si（100）衬底上通过脉冲激光沉积PLD来生长薄膜。基板平面并平行于等离子体膨胀轴。该磁场是由矩形的Nd-Fe-B永磁体产生的，而基板恰好放在磁体表面上（Aurora方法）。观察到由于磁场的存在光发射明显增加，但是没有获得膜组成变化或厚度增加。这表明光发射的增加主要是由于电子限制而不是离子种类的限制。

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