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首页> 外文期刊>Applied Surface Science >Fabrication and annealing analysis of three-dimensional photonic crystals
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Fabrication and annealing analysis of three-dimensional photonic crystals

机译：三维光子晶体的制备与退火分析

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Three-dimensional face-centered-cubic (fcc) photonic crystals (PhCs) are fabricated on quartz substrate using vertical deposition technique, and followed by annealing in a temperature range of 200-700℃. The monodispersed SiO_2 microspheres with a diameter of 220 nm in colloidal solution are synthesized using tetraethylorthosilicate as a precursor material. The as grown opal structure exhibits a strong photonic band gap (PBG) around 450 nm in the transmission spectrum. We find that the position of PBG peak in the spectrum is relevant to incident angle of light. Moreover, it is very sensitive to annealing temperature. It quickly shifts to short wavelength direction with annealing temperature increasing. The effect results from the decrease in refraction index due to the moisture evaporation in silica microspheres.
机译：利用垂直沉积技术在石英衬底上制备了三维面心立方（FCC）光子晶体（PhC），然后在200-700℃的温度范围内进行退火。以原硅酸四乙酯为前驱体，合成了胶体溶液中直径为220 nm的单分散SiO_2微球。原来的蛋白石结构在透射光谱中约450 nm处显示出很强的光子带隙（PBG）。我们发现，PBG峰在光谱中的位置与光的入射角有关。而且，它对退火温度非常敏感。随着退火温度的升高，它迅速向短波长方向移动。该效果归因于二氧化硅微球中水分蒸发导致的折射率降低。

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