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Temperature-dependent optical absorption measurements and Schottky contact behavior in layered semiconductor n-type InSe (: Sn)

机译:层状半导体n型InSe(:Sn)中随温度变化的光吸收测量值和肖特基接触行为

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The layered n-InSe(:Sn) single crystal samples have been cleaved from a large crystal ingot grown from non-stoichiometric melt by the Bridgman-Stockbarger method. It has been made the absorption measurements of these samples without Schottky contact under electric fields of 0.0 and 6000 V cm~(-1). The band gap energy value of the InSe:Sn has been calculated as 1.36 ± 0.01 eV (at 10 K) and 1.28 ± 0.01 eV (at 300 K) under zero electrical field, and 1.31 ± 0.01 eV (at 10 K) and 1.26 ± 0.01 eV (at 300 K) under 6000 Vcm~(-1). The current-voltage (I-V) characteristics of Au-Ge/InSe(:Sn)/In Schottky diodes have been measured in the temperature range 80-320 K with a temperature step of 20 K. An experimental barrier height (BH) Φ_(ap) value of about 0.70 ± 0.01 eV was obtained for the Au-Ge/InSe(:Sn)/In Schottky diode at the room temperature (300 K). An abnormal decrease in the experimental BH Φ_b and an increase in the ideality factor n with a decrease in temperature have been explained by the barrier inhomogeneities at the metal-semiconductor interface. From the temperature-dependent I-V characteristics of the Au-Ge/InSe(:Sn)/In contact, that is, Φ_(bo) and A~* as 0.94 ± 0.02 and 0.58 ± 0.02 eV, and 27 ± 2 and 21 ± 1 (A/cm~2 K~2), respectively, have been calculated from a modified ln(I_o/T~2) — q~2σ_s~2/2k~2T~2 versus 1/T plot for the two temperature regions. The Richardson constant values are about two times larger than the known value of 14.4 (A/cm~2 K~2) known for n-type InSe. Moreover, in the temperature range 80-320 K, we have also discussed whether or not the current through the junction has been connected with TFE.
机译:分层的n-InSe(:Sn)单晶样品已通过Bridgman-Stockbarger方法从非化学计量熔体生长的大晶锭上切下。在0.0和6000 V cm〜(-1)的电场下,已经对这些样品进行了无肖特基接触的吸收测量。 InSe:Sn的带隙能量值已被计算为在零电场下为1.36±0.01 eV(在10 K时)和1.28±0.01 eV(在300 K时),以及1.31±0.01 eV(在10 K时)和1.26在6000 Vcm〜(-1)下为±0.01 eV(在300 K下)。已在80-320 K的温度范围内以20 K的温度阶跃测量了Au-Ge / InSe(:Sn)/ In肖特基二极管的电流-电压(IV)特性。实验势垒高度(BH)Φ_(在室温(300 K)下,Au-Ge / InSe(:Sn)/ In肖特基二极管的ap)值约为0.70±0.01 eV。通过金属-半导体界面处的势垒不均匀性,可以解释实验BHΦ_b的异常降低和理想因子n随温度的降低而增加。根据Au-Ge / InSe(:Sn)/ In触点随温度变化的IV特性,即Φ_(bo)和A〜*为0.94±0.02和0.58±0.02 eV,以及27±2和21±根据修改后的ln(I_o / T〜2)— q〜2σ_s〜2 / 2k〜2T〜2相对于两个温度区域的1 / T图分别计算出1(A / cm〜2 K〜2) 。理查森常数约为n型InSe的14.4(A / cm〜2 K〜2)已知值的两倍。此外,在80-320 K的温度范围内,我们还讨论了通过结的电流是否已与TFE连接。

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