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Light induced adsorption of Si nano-composites in LiF crystals at 157 nm

机译:LiF晶体中157 nm处光诱导的Si纳米复合材料的吸附

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摘要

Si nano-composites were precipitated on LiF crystals following ablation from Si targets with laser light at 157 nm. The LiF/Si interface was analyzed with scanning electron microscopy, atomic force microscopy and energy dispersive X-ray microanalysis. It was found that Si composites were strongly attached to LiF ionic sites to form inhomogeneous structures consisted of small isotropic crystals 0.1-1 μm long, rich in Si and fluorine, which eventually further agglomerate to form larger structures. The thickness of the LiF/Si interface was increased from 50 nm to 2 μm following laser irradiation at 157 nm, due to accelerated adsorption of Si in the LiF interface by VUV light.
机译:用157 nm激光从Si靶烧蚀后,Si纳米复合材料沉淀在LiF晶体上。 LiF / Si界面通过扫描电子显微镜,原子力显微镜和能量色散X射线显微分析进行了分析。发现硅复合材料牢固地附着在LiF离子位点上,形成不均匀的结构,该结构由长0.1-1μm的富含硅和氟的各向同性小晶体组成,最终进一步团聚形成更大的结构。在157 nm激光照射后,LiF / Si界面的厚度从50 nm增加到2μm,这是由于VUV光加速了LiF界面中Si的吸附。

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