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首页> 外文期刊>Applied Surface Science >The effect of Ehrlich-Schwoebel step-edge barrier on the formation of self-organized Si nanodots by ion-sputter erosion
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The effect of Ehrlich-Schwoebel step-edge barrier on the formation of self-organized Si nanodots by ion-sputter erosion

机译：Ehrlich-Schwoebel台阶边缘势垒对离子溅射腐蚀形成自组织Si纳米点的影响

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摘要

The ion flux dependence of the self-organized Si nanodots induced by 1.5 keV Ar~+ ion sputter erosion has been studied. It shows that for the regime with ion flux > ～280 μA/cm~2, the currently adopted Bradley-Harper (BH) model, which is incorporated in a dynamic continuum equation holds valid. However, for ion flux < ～280 μA/cm~2, the measured dot size and surface roughness deviate drastically from the BH model. To interpret the data for this lower ion flux regime, the effect of the Ehrlich-Schwoebel (ES) step-edge barrier was introduced into the continuum equation. A consistency between the calculated and the experimental results was reached, furthermore, a reasonable trend was found, that is, the effective ES diffusion decreases steadily with the increasing ion flux, and at ～280 μA/cm~2, it became negligibly small.
机译：研究了1.5 keV Ar〜+离子溅射腐蚀引起的自组织Si纳米点的离子通量依赖性。结果表明，对于离子流>〜280μA/ cm〜2的状态，当前采用的Bradley-Harper（BH）模型已被纳入动态连续方程，该模型有效。然而，当离子通量<〜280μA/ cm〜2时，测得的点尺寸和表面粗糙度与BH模型大不相同。为了解释此较低离子通量状态的数据，将Ehrlich-Schwoebel（ES）台阶边缘势垒的作用引入了连续方程。达到了计算结果与实验结果的一致性，并且发现了一个合理的趋势，即有效的ES扩散随离子通量的增加而稳步下降，在〜280μA/ cm〜2时，可忽略不计。

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