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首页> 外文期刊>Applied Surface Science >Spectral diffuse reflectance measurements of gadolinia, silica thin film systems using synchrotron radiation
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Spectral diffuse reflectance measurements of gadolinia, silica thin film systems using synchrotron radiation

机译：使用同步加速器辐射测量氧化ado，二氧化硅薄膜系统的光谱漫反射率

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摘要

Diffuse reflectance or optical scattering in thin films and multilayers can pose serious limiting factors to their desired or ultimate performances. Besides, such studies provide valuable information related to the buried microstructures and interfaces. Synchrotron radiation is the most appropriate source to record wavelength dependent polarized light scattering in thin films and multilayers. In the present experiment several gadolinia, silica thin films and multilayers were studied for their light scattering using the white light synchrotron beam. Various thin film layer geometries were selected to probe the results due to different types and combinations of interfaces. Due to phase coherent delay in certain optical non-wedged component used in the experimental setup very interesting spectral interference were noticed as the modulations in the diffuse reflectance signal. Appropriate modeling approach utilizing Gaussian function de-convolution technique is used to compute the pulse delay between the back reflected and forward propagating scattering signals that lead to such spectral interference. Alternatively inverse fast Fourier transform (IFFT) and analytical techniques were adopted to determine the group delays. The diffuse reflectance spectra were finally compared with their specular counter part and a shift both in the wavelength and phase were noticed. This may be explained on the basis of thin film roughness factors, different polarizations and incident geometries used in the measurements. However, all most all the spectral scattering signals exhibited the features resembling their specular reflection characteristic.
机译：薄膜和多层膜中的漫反射或光散射会严重限制其所需性能或最终性能。此外，这些研究提供了与掩埋的微结构和界面有关的有价值的信息。同步辐射是记录薄膜和多层薄膜中与波长相关的偏振光散射的最合适的光源。在本实验中，使用白光同步加速器光束研究了几种氧化using，二氧化硅薄膜和多层膜的光散射。由于界面的类型和组合不同，因此选择了各种薄膜层几何形状来探测结果。由于在实验装置中使用的某些光学非楔形组件中的相位相干延迟，在漫反射信号中的调制被注意到是非常有趣的光谱干扰。利用高斯函数反卷积技术的适当建模方法可用于计算导致这种频谱干扰的后向反射和前向传播散射信号之间的脉冲延迟。可选地，采用快速傅里叶逆变换（IFFT）和分析技术来确定群时延。最后将漫反射光谱与它们的镜面反射部分进行比较，并观察到波长和相位都有变化。这可以基于薄膜粗糙度因子，不同的极化和在测量中使用的入射几何形状来解释。然而，所有大多数光谱散射信号都表现出类似于其镜面反射特性的特征。

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