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Development of porous metal oxide thin films by co-evaporation

机译：通过共蒸发开发多孔金属氧化物薄膜

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This paper focuses on the development of mixed metal oxide thin films and physical characterization of the films. The films were produced by co-evaporation of titanium oxide and tungsten oxide powders. This allowed the development of titanium oxide-tungsten oxide films as analyzed using XPS. Examination in the SEM and AFM showed that the films were nanoporous with the pore size and pore orientation varying as a function of the deposition angle. UV-vis spectra of the films show an increase of transmittance with increasing deposition angle which is attributed to the structure and porosity of the films. Raman analysis indicated that the as-deposited films have broad and weak Raman characteristics, attributed to the nanocrystal nature of the films and the presence of defects, and the peak broadening deceases after annealing the film, as expected.
机译：本文重点研究混合金属氧化物薄膜的发展和薄膜的物理表征。通过共蒸发氧化钛和氧化钨粉末来生产薄膜。如使用XPS所分析的，这允许形成二氧化钛-氧化钨薄膜。在SEM和AFM中的检查表明，膜是纳米多孔的，其孔径和孔取向随沉积角而变化。膜的紫外可见光谱显示出透射率随沉积角的增加而增加，这归因于膜的结构和孔隙率。拉曼分析表明，所沉积的薄膜具有较宽和较弱的拉曼特性，这归因于薄膜的纳米晶体性质和缺陷的存在，并且如预期的那样退火薄膜后峰增宽降低。

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