Preparation and characterization of titanium oxy-nitride thin films

M. Braic; M. Balaceanu; A. Vladescu; A. Kiss; V. Braic; G. Epurescu; G. Dinescu; A. Moldovan; R. Birjega; M. Dinescu

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Preparation and characterization of titanium oxy-nitride thin films

机译：氮氧化钛薄膜的制备与表征

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The interest in TiN_xO_y, films has increased recently due to their properties dependence on the N/O ratio.rnIn this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O_2 and N_2) on the properties of the TiN_xO_y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM),rnFilm structure and composition were studied by XKD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.

机译：TiN_xO_y薄膜由于其特性对N / O比的依赖而引起了人们的兴趣.rn在这项工作中，我们比较研究了反应气体（O_2和N_2）的不同流量比对TiN_xO_y的特性的影响。采用射频脉冲激光沉积（RF PLD）和反应脉冲磁控溅射（RPM）两种方法沉积薄膜，通过XKD和XPS方法研究薄膜的结构和组成，并用原子力显微镜（AFM）分析薄膜的表面形态。还确定了机械特性，如维氏显微硬度和附着力（划痕测试）。

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来源
《Applied Surface Science》 |2007年第19期|8210-8214|共5页
作者
M. Braic; M. Balaceanu; A. Vladescu; A. Kiss; V. Braic; G. Epurescu; G. Dinescu; A. Moldovan; R. Birjega; M. Dinescu;
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作者单位

Tehnoprof Center, National Institute for Optoelectronics, P.O. Box MG-05 Magurele, Bucharest RO-77125, Romania;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
Ti oxy-nitride; physical; microchemical and mechanical properties;

机译：氮氧化钛物理;微观化学和机械性能;

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Preparation and characterization of titanium oxy-nitride thin films

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