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Micro-structuring of TiO_2 thin films by laser-assisted diffraction processing

机译:激光辅助衍射法制备TiO_2薄膜的微结构

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摘要

Thin films of TiO_2 are deposited by magnetron sputtering on glass substrate and are irradiated by UV radiation using a KrF excimer laser (248 nm). These thin films are patterned with a razor blade placed on the way of the radiation just in front of the TiO_2 thin film. Just near the edge of the razor blade on the thin film, diffraction lines are observed, resulting in the ablation of the film. These patterns are characterized by optical microscopy, mechanical profilometry. Diffraction up to the 35th order is observed. The results are shown to be compatible with a model in which electronic excitation plays the major role.
机译:TiO_2薄膜通过磁控溅射沉积在玻璃基板上,并使用KrF准分子激光(248 nm)通过UV辐射进行辐照。这些薄膜是在剃须刀的TiO_2薄膜正前方的辐射路径上进行构图的。在薄膜上剃刀刀片的边缘附近,观察到衍射线,导致薄膜烧蚀。这些图案的特征在于光学显微镜,机械轮廓仪。观察到高达35阶的衍射。结果表明,该模型与其中电子激励起主要作用的模型兼容。

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