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首页> 外文期刊>Applied Surface Science >Photocatalytic Activity Of Dc Magnetron Sputter Deposited Amorphous Tio_2 Thin Films
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Photocatalytic Activity Of Dc Magnetron Sputter Deposited Amorphous Tio_2 Thin Films

机译：直流磁控溅射沉积非晶Tio_2薄膜的光催化活性

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摘要

For photocatalytic thin film applications TiO_2 is one of the most important materials. The most studied TiO_2 crystal phase is anatase, though also rutile and brookite show good photoactivity. Usually anatase or a mixture of rutile and anatase is applied for powder or thin film catalysts. It has been claimed that amorphous films do not exhibit any or only a very low photocatalytic activity. We have deposited amorphous thin films by dc magnetron sputtering from sub-stoichiometric TiO_(2-x) targets. The coatings are transparent and show a photocatalytic activity half of that of a thin layer of spin-coated reference photocatalyst powder. Annealing the thin films to yield anatase crystallization more than doubles their photocatalytic activity. At the same film thickness these thin films show the same activity as a commercially available photocatalytic coating. The dependence of the photocatalytic activity on deposition parameters like gas pressure and sputter power is discussed. A decrease in film density, as deduced from the refractive index and the microstructure, resulted in an increase in photocatalytic activity. Film thickness has a marked influence on the photocatalytic activity, showing a strong increase up to 300-400 nm, followed by a much shallower slope.
机译：对于光催化薄膜应用，TiO_2是最重要的材料之一。研究最多的TiO_2晶相是锐钛矿，尽管金红石和板钛矿也显示出良好的光活性。通常将锐钛矿或金红石和锐钛矿的混合物用于粉末或薄膜催化剂。已经要求非晶膜不显示任何或仅显示非常低的光催化活性。我们已经通过直流磁控溅射从亚化学计量的TiO_（2-x）靶沉积了非晶薄膜。涂层是透明的，并且显示出的光催化活性是旋涂参考光催化剂粉末薄层的一半。退火薄膜以产生锐钛矿结晶，其光催化活性增加了一倍以上。在相同的膜厚度下，这些薄膜表现出与可商购的光催化涂层相同的活性。讨论了光催化活性对沉积参数（如气压和溅射功率）的依赖性。由折射率和微观结构推断出的膜密度的降低导致光催化活性的提高。膜厚度对光催化活性有显着影响，显示出最大增加到300-400 nm，然后斜率要浅得多。

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