机译:铯溅射离子源与商用SIMS仪器兼容
Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England;
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA;
AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia;
Univ Ghent, Dept Analyt Chem, B-9000 Ghent, Belgium;
Univ Antwerp, Dept Chem, B-2610 Antwerp, Belgium;
caesium sputter ion source; non-additive sputtering; atomic and cluster ion bombardment; depth profiling; floating low energy ion gun; cluster-solid interaction; CLUSTER IONS; BOMBARDMENT; BEAMS;
机译:用铯溅射型离子源生产强负锂束
机译:在磁扇区SIMS仪器的二次离子加速区域中利用气态和溅射态物质的电子碰撞电离
机译:用于绝缘材料的ToF-SIMS深度剖析的氩团簇溅射源:高溅射速率和准确的界面信息
机译:散射的发射模型与商用电磁仿真工具兼容
机译:通过多仪器数据同化研究气溶胶来源,寿命和辐射强迫。
机译:一种简单廉价的核酸扩增装置无需电力—走向资源匮乏的无仪器分子诊断设定值
机译:铯溅射离子源与商用SIMS仪器兼容