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首页> 外文期刊>Applied Surface Science >SIMS characterisation of superconductive MgB2 layers prepared by ion implantation and pulsed plasma treatment
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SIMS characterisation of superconductive MgB2 layers prepared by ion implantation and pulsed plasma treatment

机译：通过离子注入和脉冲等离子体处理制备的超导MgB2层的SIMS表征

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摘要

Thin films of magnesium diboride (MgB2), an intermetallic compound, possessing superconductive properties, were analysed by secondary ion mass spectrometry (SIMS). The samples were prepared using a new two-step technique of ion implantation followed by plasma treatment. Two kinds of structures were obtained when boron and magnesium were used as targets. Eighty kiloelectronvolt magnesium ions were implanted into boron samples and 100 keV boron ions into magnesium strips. Plasma treatment was performed using hydrogen and argon 1 mu s plasma pulses of fluence 2-5 J/cm(2). Magnetic moment and electrical conductivity measurements confirmed superconducting properties of the obtained layers.
机译：通过二次离子质谱（SIMS）分析了具有超导性能的金属间化合物二硼化镁（MgB2）的薄膜。使用新的两步离子注入技术，然后进行等离子体处理，制备样品。当以硼和镁为靶时，获得两种结构。将80千电子伏特的镁离子注入到硼样品中，并将100 keV的硼离子注入到镁条中。使用氢气和氩气的1μs等离子脉冲（注量2-5 J / cm（2））进行等离子体处理。磁矩和电导率测量结果证实了所获得层的超导性能。

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