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A study of the optical properties of titanium oxide films prepared by dc reactive magnetron sputtering

机译：直流反应磁控溅射法制备二氧化钛薄膜的光学性能研究

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TiO2 thin films were deposited on the glass substrates by dc reactive magnetron sputtering technique at different sputtering pressures (2 x 10(-3) to 2 x 10(-2) mbar). The films prepared at low pressures have an anatase phase, and the films prepared at high pressures have an amorphous phase. The optical properties were studied by measuring the transmittance and the ellipsometric spectra. The optical constants of the films in the visible range were obtained by fitting the transmittance combined with the ellipsometry measurements using the classical model with one oscillator. The refractive index of the films decreases from 2.5 until 2.1 as the sputtering pressure increases from 2 x 10(-3) to 2 x 10(-2) mbar. The films prepared at the pressure higher than 6 x 10(-3) mbar show a volume inhomogeneity. This volume inhomogeneity has been calculated by fitting the transmittance and the ellipsometric spectra. The volume inhomogeneity of the film prepared at the highest sputtering pressure is about 10%. Although the films prepared at high pressures show a large volume inhomogeneity, they have low extinction coefficients. It is suggested that the anatase phase results in more light scattering than amorphous phase does, and then a high extinction coefficient. (c) 2005 Elsevier B.V. All rights reserved.
机译：通过直流反应磁控溅射技术在不同的溅射压力（2 x 10（-3）到2 x 10（-2）mbar）下，在玻璃基板上沉积TiO2薄膜。在低压下制备的膜具有锐钛矿相，而在高压下制备的膜具有非晶相。通过测量透射率和椭偏光谱研究了光学性质。膜的光学常数在可见光范围内，是通过将透射率与椭偏测量结合使用经典模型与一个振荡器拟合而获得的。随着溅射压力从2 x 10（-3）毫巴增加到2 x 10（-2）毫巴，薄膜的折射率从2.5降低到2.1。在高于6 x 10（-3）mbar的压力下制备的薄膜显示出体积不均匀性。通过拟合透射率和椭偏光谱来计算体积不均匀性。在最高溅射压力下制备的膜的体积不均匀性约为10％。尽管在高压下制备的膜表现出大的体积不均匀性，但是它们的消光系数低。建议锐钛矿相比非晶相引起更多的光散射，然后具有高消光系数。 （c）2005 Elsevier B.V.保留所有权利。

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