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Determination and analysis of dispersive optical constant of TiO2 and Ti2O3 thin films

机译:TiO2和Ti2O3薄膜的色散光学常数的测定与分析

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Electron beam evaporation technique was used to prepare TiO2 and Ti2O3 thin films onto glass substrates of thicknesses 50, 500 and 1000 run for each sample. The structural investigations revealed that the as-deposited films are amorphous in nature. Transmittance measurements in the wavelength range (350-2000 nm) were used to calculate the refractive index n and the absorption index k using Swanepoel's method. The optical constants such as optical band gap E-g(opt), optical conductivity sigma(opt), complex dielectric constant, relaxation time tau and dissipation factor tan 8 were determined. The analysis of the optical absorption data revealed that the optical band gap E-g was indirect transitions. The optical dispersion parameters E-o and E-d were determined according to Wemple and Didomenico method. (c) 2005 Published by Elsevier B.V.
机译:电子束蒸发技术用于在每个样品的厚度为50、500和1000nm的玻璃基板上制备TiO2和Ti2O3薄膜。结构研究表明,所沉积的膜本质上是非晶态的。使用Swanepoel法在波长范围(350-2000 nm)中进行透射率测量以计算折射率n和吸收系数k。确定光学常数,例如光学带隙E-g(opt),电导率sigma(opt),复介电常数,弛豫时间tau和损耗因子tan 8。对光吸收数据的分析表明,光学带隙E-g是间接跃迁。根据Wemple和Didomenico方法确定光学色散参数E-o和E-d。 (c)2005年由Elsevier B.V.

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