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Thin multilayers characterization by grazing X-ray reflectometry and use of Fourier transform

机译:通过掠射X射线反射仪和傅立叶变换来表征薄多层

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Grazing X-ray reflectometry is used in order to characterize thin layer stacks, in particular periodic multilayers. The specular reflectivity depends on the thickness, the complex refractive index of each layer and on the roughness of the interfaces. By a trial and error method, the experimental reflectivity curve can be fitted with a theoretical one, and so, the parameters of the stack can be obtained. This numerical method needs usually initial guess of the kind of results. Fourier transform method allows to obtain directly the values of distances between interfaces, with a good approximation depending on the maximum angular scan of the measure. It can also reveal some particularity of the multilayer, i.e. periodic multilayered structures with more than two layers per period. As an illustration of this characterization method, some examples in XUV optical domain will be shown. This method can also be used for the characterization of many kinds of multilayer stacks, in particular semi-conductor heterostructures ones, under the condition that adjacent layers have sufficient contrast index at the wavelength of the X-ray source. (c) 2006 Elsevier B.V. All rights reserved.
机译:使用掠过的X射线反射法来表征薄层堆叠,特别是周期性多层。镜面反射率取决于厚度,每一层的复折射率以及界面的粗糙度。通过反复试验的方法,可以将实验反射率曲线与理论曲线拟合,从而获得叠层的参数。这种数值方法通常需要对结果类型进行初步猜测。傅里叶变换方法允许直接获得界面之间的距离值,并根据测度的最大角度扫描获得良好的近似值。它也可以揭示多层的某些特殊性,即每个周期具有两层以上的周期性多层结构。作为此表征方法的说明,将显示XUV光学领域的一些示例。在相邻的层在X射线源的波长处具有足够的对比度的条件下,该方法还可以用于表征多种多层堆叠,特别是半导体异质结构。 (c)2006 Elsevier B.V.保留所有权利。

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