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Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

机译：负离子元素杂质对HfO2薄膜激光诱导损伤阈值的影响

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Negative ion element impurities breakdown model in HfO2 thin film was reported in this paper. The content of negative ion elements were detected by glow discharge mass spectrum analysis (GDMS); HfO2 thin films were deposited by the electron-beam evaporation method. The weak absorption and laser induced damage threshold (LIDT) of HfO2 thin films were measured to testify the negative ion element impurity breakdown model. It was found that the LIDT would decrease and the absorption would increase with increasing the content of negative ion element. These results indicated that negative ion elements were harmful impurities and would speed up the damage of thin film. (c) 2006 Elsevier B.V. All rights reserved.
机译：本文报道了HfO2薄膜中的负离子杂质杂质分解模型。负离子元素的含量通过辉光放电质谱分析（GDMS）进行检测。通过电子束蒸发法沉积HfO2薄膜。测量了HfO2薄膜的弱吸收和激光诱导损伤阈值（LIDT），以证明负离子元素杂质击穿模型。已经发现，随着负离子元素含量的增加，LIDT会减少，吸收会增加。这些结果表明负离子元素是有害的杂质，并会加速薄膜的破坏。 （c）2006 Elsevier B.V.保留所有权利。

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