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Effect of thickness on the structure, morphology and optical properties of sputter deposited Nb2O5 films

机译：厚度对溅射沉积Nb2O5薄膜结构，形态和光学性能的影响

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摘要

Nb2O5 films with the thickness (d) ranging from 55 to 2900 nm were deposited on BK-7 substrates at room temperature by a low frequency reactive magnetron sputtering system. The structure, morphology and optical properties of the films were investigated by X-ray diffraction, atomic force microscopy and spectrophotometer, respectively. The experimental results indicated that the thickness affects drastically the structure, morphology and optical properties of the film. There exists a critical thickness of the film, d(cri) =2010 nm. The structure of the film remains amorphous as d < d(cri). However, it becomes crystallized as d > d(cri). The root mean square of surface roughness increases with increasing thickness as d > 1080 nm. Widths and depths of the holes on film surface increase monotonously with increasing thickness, and widths of the holes are larger than 1000 nm for the crystalline films. Refractive index increases with increasing thickness as d < d(cri), while it decreases with increasing thickness as d > d(cri). In addition, the extinction coefficient increases with increasing thickness as d > d(cri). (c) 2006 Elsevier B.V. All rights reserved.
机译：在室温下，通过低频反应磁控溅射系统在BK-7衬底上沉积厚度（d）为55至2900 nm的Nb2O5膜。分别通过X射线衍射，原子力显微镜和分光光度计研究了薄膜的结构，形貌和光学性能。实验结果表明，厚度极大地影响了薄膜的结构，形态和光学性能。薄膜的临界厚度为d（cri）= 2010 nm。当d ＜d（cri）时，膜的结构保持非晶态。但是，其结晶为d> d（cri）。当d> 1080 nm时，表面粗糙度的均方根随厚度增加而增加。膜表面上的孔的宽度和深度随着厚度的增加而单调增加，并且对于结晶膜，孔的宽度大于1000nm。当d d（cri）时，折射率随厚度增加而减小。另外，随着d> d（cri），消光系数随着厚度的增加而增加。 （c）2006 Elsevier B.V.保留所有权利。

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