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The surface modification of nanoporous SiOx thin films with a monofunctional organosilane

机译:用单官能有机硅烷对纳米多孔SiOx薄膜进行表面改性

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摘要

The surfaces of nanostructured, porous SiOx/Si (air-oxidized Si) and SiOx thin films, deposited by excimer laser ablation in He and He + O-2 gas ambients, respectively, have been modified by the deposition of a monofunctional organosilane. They were characterized using photoacoustic Fourier-transform infrared (FTIR) X-ray photoelectron (XPS) spectroscopies, and field-emission scanning electron microscopy (FESEM). Photoacoustic FTIR analysis indicates that the organosilane has hydrolyzed to form a silanol, which has chemically reacted with SiOx through its surface silanol (-SiOH) group, to form siloxane (Si-O-Si) structures. An enhanced IR spectral signal is found, due to the expansion and contraction of both the pores of the solid and the gas within them. (c) 2005 Elsevier B.V. All rights reserved.
机译:分别通过准分子激光烧蚀在He和He + O-2气体环境中沉积的纳米结构多孔SiOx / Si(空气氧化的Si)和SiOx薄膜的表面已通过单官能有机硅烷的沉积进行了改性。使用光声傅立叶变换红外(FTIR)X射线光电子(XPS)光谱仪和场发射扫描电子显微镜(FESEM)对它们进行了表征。光声FTIR分析表明,有机硅烷已水解形成硅烷醇,该硅烷醇通过其表面硅烷醇(-SiOH)基团与SiOx化学反应,从而形成了硅氧烷(Si-O-Si)结构。由于固体孔和其中的气体的膨胀和收缩,发现增强的IR光谱信号。 (c)2005 Elsevier B.V.保留所有权利。

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