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首页> 外文期刊>Applied Surface Science >Electrochemical, SEM/EDS and quantum chemical study of phthalocyanines as corrosion inhibitors for mild steel in 1 mol/l HCl
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Electrochemical, SEM/EDS and quantum chemical study of phthalocyanines as corrosion inhibitors for mild steel in 1 mol/l HCl

机译：酞菁作为缓蚀剂在1 mol / l HCl中的缓蚀剂的电化学，SEM / EDS和量子化学研究

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The inhibition effect of metal-free phthalocyanine (H2Pc), copper phthalocyanine (CuPc) and copper phthalocyanine tetrasulfuric tetrasodium salt (CuPc center dot S(4)center dot Na-4) on mild steel in I mol/l HCl in the concentration range of 1.0 X 10(-5) to 1.0 X 10(-3) mol/l was investigated by electrochemical test, scanning electron microscope with energy dispersive spectrometer (SEM/EDS) and quantum chemical method. The potentiodynamic polarization curves of mild steel in hydrochloric acid containing these compounds showed both cathodic and anodic processes of steel corrosion were suppressed, and the Nyquist plots of impedance expressed mainly as a capacitive loop with different compounds and concentrations. For all these phthalocyanines, the inhibition efficiency increased with the increase in inhibitor concentration, while the inhibition efficiencies for these three phthalocyanines with the same concentration decreased in the order Of CuPc center dot S(4)center dot Na-4 > CuPc > H2Pc according to the electrochemical measurement results. The SEM/EDS analysis indicated that there are more lightly corroded and oxidative steel surface for the specimens after immersion in acid solution containing 1.0 x 10(-3) mol/l phthalocyanines than that in blank. The quantum chemical calculation results showed that the inhibition efficiency of these phthalocyanines increased with decrease in molecule's LUMO energy, which was different from the micro-cyclic compounds. (c) 2005 Elsevier B.V. All rights reserved.
机译：浓度范围为1 mol / l HCl中的无金属酞菁（H2Pc），铜酞菁（CuPc）和铜酞菁四硫四钠盐（CuPc中心点S（4）中心点Na-4）对低碳钢的抑制作用通过电化学测试，带能量色散谱仪（SEM / EDS）的扫描电子显微镜和量子化学方法研究了1.0 X 10（-5）到1.0 X 10（-3）mol / l的摩尔比。低碳钢在含有这些化合物的盐酸中的电势极化曲线表明，钢腐蚀的阴极和阳极过程均受到抑制，并且阻抗的奈奎斯特图主要表示为具有不同化合物和浓度的电容环。对于所有这些酞菁类化合物，抑制效率均随抑制剂浓度的增加而增加，而这三种浓度相同的酞菁类化合物的抑制效率则按CuPc中心点S（4）中心点Na-4> CuPc> H2Pc的顺序降低。电化学测量结果。 SEM / EDS分析表明，浸入含有1.0 x 10（-3）mol / l酞菁的酸性溶液中后，与空白试样相比，试样的腐蚀和氧化钢表面更多。量子化学计算结果表明，这些酞菁的抑制效率随分子LUMO能量的降低而增加，这与微环化合物不同。 （c）2005 Elsevier B.V.保留所有权利。

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