• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Applied Surface Science >Structures and electrochromic properties of tungsten oxide films prepared by magnetron sputtering
【24h】

Structures and electrochromic properties of tungsten oxide films prepared by magnetron sputtering

机译：磁控溅射氧化钨薄膜的结构和电致变色性能

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Tungsten oxide (WO3) films were deposited by DC magnetron sputtering of tungsten target in O-2/Ar atmosphere. The structures of the films following the various 02 flow rate in a fixed Ar gas supply were investigated by X-ray diffraction patterns, Raman spectra and transmission electron microscopy. The electrochromic properties were characterized by a cyclic voltammetry and UV-vis absorption spectra. The results show that nanocrystalline WO3 film with crystallite size about 10 - 20 nm, deposited at 16 Seem 02, has larger charge capacity and coloration efficiency than the other amorphous films. Post-annealing the film at 200 degrees C would create 30 - 50 nm nanocrystalline film, whose electrochromic properties are promoted further due to even larger internal volume, essential to conduct ions and electrons for electrochromic intercalation. However, the electrochromic property deteriorates apparently in the film with 60 - 100 nm nanocrystallites annealed at 300 degrees C, which may be caused by another electrochromism occurring always in the well-crystallized WO3 films (c) 2005 Elsevier B.V. All rights reserved.
机译：在O-2 / Ar气氛中，通过直流磁控溅射钨靶沉积氧化钨（WO3）膜。通过X射线衍射图谱，拉曼光谱和透射电子显微镜研究了在固定的Ar气源中随02流量变化的薄膜结构。电致变色性质通过循环伏安法和UV-vis吸收光谱表征。结果表明，以16 Seem 02沉积的微晶尺寸为约10-20 nm的纳米晶WO3膜具有比其他非晶膜更大的电荷容量和着色效率。在200摄氏度下对薄膜进行后退火将产生30至50 nm的纳米晶体薄膜，由于更大的内部体积（电导离子和电子进行电致变色嵌入所必不可少的），其电致变色性能得到了进一步提升。但是，在300摄氏度下退火的60-100 nm纳米微晶的薄膜中，电致变色性能明显下降，这可能是由于在良好结晶的WO3薄膜中总会发生另一种电致变色现象（c）2005 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号