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首页> 外文期刊>Applied Surface Science >Optical thin film formation by oxygen cluster ion beam assisted depositions
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Optical thin film formation by oxygen cluster ion beam assisted depositions

机译：通过氧簇离子束辅助沉积形成光学薄膜

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摘要

O_2 gas cluster ion beam (O_2-GCIB) assisted depositions were employed to deposit high quality dielectric films (Ta_2O_5, Nb_2O_5 and SiO_2). The optimum irradiation energy and ion current density for Ta_2O_5 films were 5 to 9 keV and 0.5 μA/cm~2, respectively. The Ta_2O_5/SiO_2 films deposited with O_2-GCIB irradiation showed very uniform and dense structures without columnar or porous structures. Due to the significant surface roughness improvement effect of GCIB, the surface roughness decreased even though the films were deposited on a rough surface. The Nb_2O_5/SiO_2 interference filter deposited with O_2-GCIB assisted deposition was very stable and there was no shift of wavelength before and after environmental tests.
机译：O_2气体团簇离子束（O_2-GCIB）辅助沉积用于沉积高质量的介电膜（Ta_2O_5，Nb_2O_5和SiO_2）。 Ta_2O_5薄膜的最佳辐照能量和离子电流密度分别为5〜9 keV和0.5μA/ cm〜2。用O_2-GCIB辐照沉积的Ta_2O_5 / SiO_2薄膜显示出非常均匀且致密的结构，没有柱状或多孔结构。由于GCIB的表面粗糙度改善效果显着，即使将膜沉积在粗糙表面上，表面粗糙度也会降低。用O_2-GCIB辅助沉积的Nb_2O_5 / SiO_2干涉滤光片非常稳定，在环境测试前后，波长没有变化。

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